D2S
D2S provides GPU-accelerated computational lithography software and hardware, including the TrueMask product family and Computational Design Platform, to leading-edge semiconductor manufacturers, mask shops, and equipment OEMs for curvilinear ILT, mask data preparation, and deep learning applications at sub-7nm nodes.
- Company typePrivate
- Founded2007
- HeadquartersSan Jose, United States
- Headcount11–50
- GTM typeB2B
- OfferingSoftware
What D2S does
D2S, Inc. is a privately-held semiconductor manufacturing software company founded in 2007 and headquartered in San Jose, California. It develops GPU-accelerated computational lithography and mask design tools that address computational bottlenecks at advanced semiconductor nodes, with particular focus on curvilinear mask shapes for sub-7nm manufacturing. The company's technical foundation is the Computational Design Platform (CDP), a rack-scale GPU compute platform built on NVIDIA CUDA architectures (evolving from Tesla K80 through Pascal P40, V100, and Ampere A40) that delivers up to 1.8 PFLOPS of single-precision performance per rack and achieves 7-54X speedups over CPU-only approaches across mask data preparation, ILT, and metrology workloads.
The product portfolio centers on the TrueMask family — TrueMask ILT (stitchless full-chip curvilinear inverse lithography), TrueMask MDP (model-based mask data preparation delivering 20-30%+ write-time reduction), TrueMask DS (mask-wafer double simulation), TrueMask DLK (deep learning kit for manufacturing R&D), TrueMask WPA (wafer plane analysis for CD-SEM integration), and the TrueModel unified physical mask model supporting EUV, multi-beam, and 193i lithography. D2S derives revenue from direct enterprise sales of CDP hardware-and-software bundles to semiconductor manufacturers and mask shops, one-time software licensing of TrueMask products, and OEM/embedded licensing where its GPU-acceleration stack is integrated into equipment from NuFlare Technology (multi-beam mask writers), Advantest (CD-SEM systems), and simulator partners (aBeam, Fastlitho).
The company sells into a narrow set of leading-edge logic and memory fabs, photomask producers, and equipment OEMs globally, supported by an indirect presence in Japan through subsidiary D2S KK. Strategic investors include DAG Ventures, Benchmark, Cadence, NuFlare Technology, and Advantest. D2S manages the eBeam Initiative industry consortium, co-founded the Center for Deep Learning in Electronics Manufacturing (CDLe) with Mycronic and NuFlare, and holds 100+ granted US patents across its computational lithography portfolio.
D2S firmographics
Firmographics- Name
- D2S
- Legal name
- D2S, Inc.
- Website
- https://design2silicon.com
- Company type
- Private
- Founded year
- 2007
- Operating status
- Operating
- Headcount range
- 11–50 employees
- Short description
- D2S provides GPU-accelerated computational lithography software and hardware, including the TrueMask product family and Computational Design Platform, to leading-edge semiconductor manufacturers, mask shops, and equipment OEMs for curvilinear ILT, mask data preparation, and deep learning applications at sub-7nm nodes.
- Ownership category
- akta.pro rank
D2S industry classification
Industry- Product category
- Computational Lithography Software
- NAICS
- Other Electronic Component Manufacturing (334419), Other Measuring and Controlling Device Manufacturing (334519)
- SIC
- Electronic Components, Nec (3679)
- akta.pro primary industry
- Physical Design, DFM & Manufacturing/Mask Data Prep (HDAHAFAC)
Keywords
Where D2S is headquartered
LocationHeadquarters
- HQ city
- San Jose
- HQ country
- United States
- HQ region
- North America
Offices2 records
Markets served
D2S business model
Business model- GTM type
- B2B
- Offering type
- Software
- Cost components
- Technology or R&D, Infrastructure, Personnel, Marketing or Sales, Supply Chain
Revenue model
- GPU-Accelerated Computational Design Platform (CDP) Hardware and Software: D2S sells its CDP hardware platform (featuring NVIDIA GPUs) along with software applications as an integrated solution for semiconductor manufacturing. The platform is deployed in cleanroom production environments and offered both as standalone products and as OEM additions to manufacturing equipment.
- TrueMask Software Products: TrueMask family of software products including TrueMask ILT, TrueMask MDP, TrueMask DS, TrueMask DLK, TrueMask WPA, and TrueModel. These are sold as software licenses and potentially as part of integrated hardware-software solutions to semiconductor manufacturers.
- OEM/Embedded Software Licensing: D2S embeds its GPU-accelerated platform as custom OEM additions to manufacturing systems from partners such as NuFlare Technology and Advantest. This generates licensing revenue through equipment manufacturers integrating D2S technology into their own products.
Go-to-market motion1 record
Distribution channels2 records
Marketing channels6 records
D2S product offering
Product offeringCore offering
D2S provides a GPU-accelerated Computational Design Platform (CDP) and a suite of TrueMask software products that enable simulation-based semiconductor mask and wafer design and analysis, particularly for curvilinear shapes. The company sells both integrated hardware-software solutions deployed in cleanroom production environments and software licenses for inverse lithography technology, mask data preparation, mask-wafer simulation, deep learning, and wafer plane analysis to semiconductor fabs, mask shops, and equipment OEMs.
Product overview
D2S provides GPU-acceleration solutions for semiconductor manufacturing, built around the Computational Design Platform (CDP) as the core infrastructure powering the TrueMask product family. The portfolio includes TrueMask ILT (curvilinear inverse lithography technology enabling full-chip ILT in a day), TrueMask MDP (model-based mask data preparation), TrueMask DS (mask-wafer double simulation), TrueMask DLK (deep learning kit for semiconductor R&D), TrueMask WPA (wafer plane analysis for CD-SEM integration), and TrueModel (physical mask model). All products leverage GPU acceleration via the CDP platform, which achieves 1.8 PFLOPS processing power using NVIDIA GPUs, enabling simulation-based accurate manipulation and analysis particularly for curvilinear shapes which are impractical with CPU-only approaches.
Differentiator
Problem solved
Functional benefit
Brands
- TrueMask: TrueMask product family including ILT, MDP, DS, DLK, and WPA - GPU-accelerated mask design and analysis solutions
- TrueModel
- CDP
- eBeam Initiative
- CDLe
Products and services
- Computational Design Platform (CDP) GPU-accelerated computing platform providing 1.8 PFLOPS of processing power using NVIDIA A40 GPUs. The foundational infrastructure enabling all D2S TrueMask products for semiconductor design and manufacturing simulation, including curvilinear ILT, mask process correction, and deep learning applications. Sold to semiconductor manufacturers and embedded as OEM additions to manufacturing equipment.
- TrueMask ILT Full-chip curvilinear inverse lithography technology (ILT) software solution that enables Entirely Curvilinear masks in a day. Uses a unique stitchless approach with GPU acceleration to optimize the entire chip as a whole, producing ideal lithography results through mathematically rigorous inverse computation. For semiconductor manufacturers and mask shops at leading-edge process nodes.
- TrueMask MDP GPU-accelerated, model-based mask data preparation (MB-MDP) software solution. Reduces eBeam shot count by 20-30% or more while improving wafer quality through built-in mask process correction (MPC) for both ArF and EUV masks. Supports Manhattanized, curvilinear, and ideal ILT mask shapes. For semiconductor manufacturers and mask shops producing advanced lithography masks.
- TrueMask DS GPU-accelerated mask-wafer double simulation software platform for R&D exploration, bit-cell design, hot-spot analysis, and mask-defect categorization. Comprehends overlapping shots and dose modulation for both 193i and EUV lithography simulation including rigorous EUV mask 3D simulation. For semiconductor R&D teams and mask designers.
- TrueMask DLK Deep learning kit that accelerates R&D for semiconductor manufacturing. Combines GPU-accelerated mask/wafer simulation, pre-trained neural networks, and partner simulators (eBeam from aBeam Technologies, lithography from Fastlitho) to enable companies to do deep learning on their own data. For semiconductor manufacturers and R&D teams applying deep learning to manufacturing.
- TrueMask WPA GPU-accelerated aerial simulation tool that integrates with mask CD-SEM systems. Provides fast, highly accurate and repeatable CD metrology for complex and curvilinear mask shapes for both 193i and EUV masks, enabling wafer-level CD analysis and mask defect dispositioning. Integrated into Advantest MVM-SEM systems.
- TrueModel GPU-accelerated physical mask model that provides a single, unified model for EUV, multi-beam, and 193i lithography applications. Includes complex modeling of dose, shape, and exposure for accurate simulation of advanced designs including curvilinear designs. Available in TrueMask products and inline PLDC capability.
Quantifiable outcome
- GPU+CPU solution is ~8X faster than CPU-only for PLDC Manhattan shapes (total processing)
- +10 more outcomes
Companies that use D2S
Customer profileNamed customers4 records
Segments3 records
Ideal customer profiles3 records
D2S technology and API
TechnologyTechnology focussed Yes
API detail
- Has API
- No
- API docs
- API detail
Core technology
AI maturity
App detail
Integration3 records
AI capability6 records
Feature9 records
D2S partnerships and signals
Strategic signalPartnerships
Seven partnerships are on record, tiered core and supporting.
- NuFlare TechnologycoreNuFlare Technology is a founding member of the CDLe alliance (2018-2023) alongside D2S and Mycronic. D2S GPU-acceleration technology is embedded as OEM integration into NuFlare's multi-beam mask writers (MBM-1000, MBM-2000), enabling inline pixel-level dose correction (PLDC) and inline linearity correction for the first time. The partnership enables zero-turnaround-time mask process correction in multi-beam mask writing.
- MycroniccoreMycronic is a founding member of the CDLe (Center for Deep Learning in Electronics Manufacturing), a five-year alliance (2018-2023) with D2S and NuFlare Technology. CDLe successfully completed over 30 production deep learning projects for electronics manufacturing using digital twin technology.
- AdvantestcoreD2S partnered with Advantest to integrate the Wafer Plane Analysis Engine into Advantest's Mask MVM-SEM (Multi Vision Metrology Scanning Electron Microscope) systems. This enables fast, highly repeatable CD metrology for complex photomask shapes including ILT patterns, providing cost-effective wafer plane analysis within the CD-SEM workflow.
- NVIDIAcoreD2S software applications are based on NVIDIA CUDA parallel computing platform. D2S CDPs feature NVIDIA GPUs (Tesla K80, Pascal P40, V100, Ampere A40). NVIDIA has featured D2S as an example of GPU computing application in semiconductor manufacturing at multiple industry events.
- FastlithosupportingFastlitho provides a rigorous full-feature ArF/EUV lithography simulator including mask 3D effects for D2S TrueMask DLK. Fastlitho's Quantum simulator works 1000X faster with better accuracy than other tools and is OEM'd through D2S for use in deep learning training data generation.
- aBeam TechnologiessupportingaBeam Technologies provides a rigorous eBeam simulator integrated into D2S TrueMask DLK for deep learning training data generation. The aSEM and Chariot simulators from aBeam enable accurate SEM or eBeam inspection image simulation.
- CDLe (Center for Deep Learning in Electronics Manufacturing)coreCDLe was a five-year (2018-2023) strategic alliance between D2S, Mycronic, and NuFlare Technology. Industry leaders recognized deep learning's problem-solving potential for electronics manufacturing and used digital twin technology to bridge the data gap. CDLe completed over 30 production DL projects. D2S serves as a founding member.
Scale indicators5 records
Recent moves6 records
Expansion highlights5 records
D2S competitors and assessment
Company assessmentDirect peers
- NuFlare Technology: NuFlare is a leading mask writer manufacturer (electron beam and multi-beam) and a strategic partner/investor of D2S. While primarily an equipment vendor, NuFlare's multi-beam mask writers (MBM-1000, MBM-2000) integrate D2S' PLDC technology, making it both a partner and adjacent player in advanced mask manufacturing.
- Advantest: Advantest is a major semiconductor test and metrology equipment manufacturer and an investor/partner of D2S. Its MVM-SEM systems integrate D2S' TrueMask WPA for CD metrology, creating both partnership and adjacent competition in mask metrology workflows.
- Mycronic: Mycronic is a Swedish mask writer manufacturer and a founding member of the CDLe alliance with D2S. It serves the photomask manufacturing market with mask writers and provides an adjacent product portfolio to D2S in mask production equipment.
Broad incumbents
- ASML: ASML is the monopolistic provider of advanced lithography systems (EUV, DUV) and therefore a key determinant of the lithography ecosystem in which D2S operates. While not a direct competitor, ASML's computational lithography efforts and partnerships with EDA vendors create a large incumbent backdrop.
- KLA Corporation: KLA is the dominant provider of semiconductor process control and yield management solutions, including mask inspection and metrology. It is a broad incumbent with adjacent offerings in mask-related measurement and inspection where D2S' TrueMask WPA and TrueMask DS compete or complement.
- Applied Materials: Applied Materials is a major semiconductor equipment manufacturer with broad offerings in etch, deposition, and inspection. While not focused on computational lithography, it represents a broad incumbent in semiconductor manufacturing whose technology roadmap and customer relationships create competitive context.
- Siemens EDA (Siemens Digital Industries Software): Siemens EDA (formerly Mentor Graphics) provides Calibre OPC and mask data preparation tools used by leading semiconductor manufacturers. It is a broad incumbent competitor in computational lithography, though without D2S' specialized GPU acceleration for curvilinear ILT.
- Synopsys: Synopsys is the largest EDA vendor with a comprehensive mask synthesis, OPC, and computational lithography portfolio (Proteus, Sentaurus). It competes directly with D2S in mask data preparation and curvilinear solutions, but as part of a much broader full-flow EDA offering rather than specializing in GPU-accelerated mask simulation.
- Cadence Design Systems: Cadence is a top-3 EDA incumbent offering mask synthesis, OPC, and physical verification tools. Notably, Cadence is also an investor in D2S. Cadence competes in mask data preparation but lacks D2S' specialized GPU-accelerated curvilinear ILT and pixel-domain computing focus.
Emerging players
- Siemens Digital Industries Software (Computational Lithography): Through Calibre nmOPC and other computational lithography tools, Siemens EDA represents an emerging threat in GPU-accelerated mask synthesis. Recent Siemens investments in computational lithography capabilities make it an emerging competitor to D2S' specialized offerings.
Market position
Strengths5 records
Weaknesses5 records
Competitive moat5 records
Key risks7 records
Key highlights7 records
Customer concentration
D2S social profiles
Digital presenceD2S financial estimates
Financial estimateRevenue estimate
Valuation estimate
D2S leadership team
Management profileNumber of profiles
Profiles13 records
D2S funding detail
Funding detailFunding overview
Funding rounds3 records
Investors5 records
Funding detail is available on the Subscription and Enterprise plan.Contact sales →
D2S M&A and investment
M&A and investmentM&A
Investments
M&A and investment is available on the Subscription and Enterprise plan.Contact sales →
Frequently asked questions about D2S
What does D2S do?
D2S provides a GPU-accelerated Computational Design Platform (CDP) and a suite of TrueMask software products that enable simulation-based semiconductor mask and wafer design and analysis, particularly for curvilinear shapes. The company sells both integrated hardware-software solutions deployed in cleanroom production environments and software licenses for inverse lithography technology, mask data preparation, mask-wafer simulation, deep learning, and wafer plane analysis to semiconductor fabs, mask shops, and equipment OEMs.
Is D2S a public or private company?
D2S is a private company. It is classified as venture growth investor backed and is currently operating.
When was D2S founded?
D2S was founded in 2007. It employs 11 to 50 people.
Where is D2S based?
D2S is headquartered in San Jose, United States, in the North America region.
How does D2S make money?
Three revenue lines are on record. GPU-Accelerated Computational Design Platform (CDP) Hardware and Software is the primary driver. The others are trueMask Software Products and OEM/Embedded Software Licensing.
Who are D2S's main competitors?
Direct peers on record are NuFlare Technology, Advantest and Mycronic. Broad incumbents are ASML, KLA Corporation, Applied Materials, Siemens EDA (Siemens Digital Industries Software), Synopsys and Cadence Design Systems. Siemens Digital Industries Software (Computational Lithography) is listed as an emerging player.
Does D2S have an API?
No public API is recorded for D2S.
What industry is D2S in?
D2S's product category is Computational Lithography Software. Its primary akta.pro industry code is HDAHAFAC, Physical Design, DFM & Manufacturing/Mask Data Prep. Its NAICS code is 334419 and its SIC code is 3679.