EMD

What EMD does

EMD Corporation (株式会社イー・エム・ディー) is a privately held Japanese engineering company and wholly owned subsidiary of SCREEN Holdings, founded in November 2002 and headquartered within SCREEN's Yasu City facility in Shiga Prefecture. The company commercializes the proprietary Low Inductance Antenna (LIA) plasma technology, co-developed with Osaka University and licensed from the Japan Science and Technology Agency (JST). LIA uses an array of small, low-inductance antennas placed inside the vacuum chamber behind a dielectric, energized by phase-controlled RF signals, to generate high-density, large-area plasma with low plasma potential — addressing uniformity and damage limitations of conventional CCP and ICP sources.

EMD's product portfolio centers on research-grade plasma systems: a long-type LIA plasma system (200mm × 800mm, 3kW RF) for surface treatment of large-area films, a plasma distribution evaluation system for 2D plasma characterization, a high-density plasma-assisted sputter cathode that combines DC sputter deposition with LIA plasma, drum-type and multi-chamber multi-layer film formation systems for thin-film device R&D, and compact research plasma processing units for CVD and etching. Two 2017 filings extend the IP base into impurity activation and semiconductor surface modification.

The business model is hybrid: design, manufacture, and sale of custom surface treatment and research equipment (hardware sales) paired with investigation, consulting, and contracted R&D services in plasma and electromagnetic process technology (professional services). GTM is sales-led and direct, with the company engaging enterprise customers in semiconductors, LCD/organic EL displays, thin-film solar cells, LEDs, and carbon materials (graphene, CNT, DLC) through technical consulting and joint development. Pricing is not publicly disclosed and equipment is built to customer specifications. The company has a single named executive (Representative Director and President Akinori Ebe / 江部 明憲) and the smallest possible public capital base (¥36 million registered), consistent with a small, R&D-intensive subsidiary operating inside a much larger corporate parent.

Name

EMD

Legal name

株式会社イー・エム・ディー

Website

https://emd.co.jp

Company type

Private

Founded year

2002

Operating status

Operating

Short description

EMD Corporation is a privately held Japanese subsidiary of SCREEN Holdings that designs and manufactures proprietary Low Inductance Antenna (LIA) plasma research systems and offers plasma process consulting to semiconductor, display, solar, LED, and carbon-materials manufacturers.

Ownership category

akta.pro rank

Product category

Plasma Processing Equipment

NAICS

Semiconductor Machinery Manufacturing (333242), Other Electrical Equipment and Component Manufacturing (3359)

SIC

Electronic & Other Electrical Equipment (No Computer Equip) (3600), Miscellaneous Electrical Machinery, Equipment & Supplies (3690), Services-Commercial Physical & Biological Research (8731)

akta.pro primary industry

Deposition Equipment (CVD/PVD/ALD/Epitaxy) (HDAHAEAB)

akta.pro secondary industry

Industrial Electronics Manufacturing Services (EMS) (IMAGAGAA)

Keywords

• Plasma processing equipment
• Thin film deposition
• Surface treatment systems
• Low inductance antenna
• Semiconductor process technology

Headquarters

HQ city

Yasu

HQ country

Japan

HQ region

Asia

Offices1 record

Markets served

GTM type

B2B

Offering type

Hardware or Manufacturing

Cost components

Technology or R&D, Personnel, Operations, Marketing or Sales

Revenue model

1. Surface treatment equipment design, manufacturing, and sales: Design, manufacture, and sale of surface treatment equipment including LIA plasma systems and research systems for thin film deposition and etching processes.
2. Research consulting and outsourcing: Investigation services and consulting related to plasma and electromagnetic process technology, as well as contracted R&D services.

Go-to-market motion1 record

Distribution channels1 record

Marketing channels1 record

Core offering

EMD designs, manufactures and sells plasma processing equipment and research systems built around its proprietary Low Inductance Antenna (LIA) plasma technology. Offerings include long-type LIA plasma systems, plasma distribution evaluation systems, high-density plasma assisted sputter cathodes, multi-layer film formation equipment and compact research plasma processing units for thin-film deposition, etching and surface treatment. The company also provides plasma technology consulting, process investigation services and contracted R&D targeting display, solar cell, LED and carbon-material manufacturers plus research institutions.

Product overview

EMD offers a portfolio of plasma technology products centered on its proprietary Low Inductance Antenna (LIA) technology, developed in collaboration with Osaka University. The core LIA product enables high-density, large-area plasma generation with minimal substrate damage. The product lineup includes research systems for thin film device development: long-type LIA plasma systems for surface treatment, plasma distribution evaluation systems, high-density plasma-assisted sputter cathodes, drum-type multi-layer film formation equipment, multi-chamber systems for multi-layer deposition, and compact research plasma processing units. These systems serve applications in liquid crystal displays, organic EL, solar cells, LEDs, and carbon-based materials.

Differentiator

Problem solved

Functional benefit

Brands

• LIA (低インダクタンス天线 / Low-Inductance Antenna): Proprietary plasma generation technology co-developed with Osaka University, enabling high-density, large-area uniform plasma generation with reduced plasma damage.

Products and services

• Low Inductance Antenna (LIA / 低インダクタンスアンテナ) Core Technology Proprietary plasma technology featuring a low-inductance antenna developed through a multi-antenna configuration jointly with Osaka University, enabling high-density, large-area plasma generation with minimal substrate damage for thin film formation. Targeted at display, solar cell, LED, and carbon-materials manufacturers plus research institutions.
• Long-Type LIA Plasma System (長尺型LIAプラズマシステム) Long-type LIA plasma research system designed for uniform processing of large areas, specifically surface treatment of tools and films with a processing area of 200mm×800mm and 3kW RF power output. Intended for thin-film device R&D customers.
• Plasma Distribution Evaluation System / Area Probe System (プラズマ分布評価システム／エリアプローブシステム) Plasma distribution evaluation system enabling continuous 2D evaluation of plasma characteristics including plasma potential and density, with PC-based monitoring and data analysis. Used by plasma researchers and equipment developers to characterize LIA plasma uniformity.
• High-Density Plasma Assisted Sputter Cathode (高密度プラズマ支援スパッタカソード) Plasma-assisted sputter cathode combining conventional DC sputter deposition with LIA high-density, low-damage plasma technology to enable high-speed, low-damage film formation for advanced thin-film R&D customers.
• Drum-Type Multi-Layer Film Formation Equipment (ドラム式多層膜形成装置) Drum-type multi-layer film formation equipment with 4 process chambers and substrate stage rotation mechanism enabling continuous multi-layer formation without atmospheric exposure, for thin-film device R&D including thin-film solar cells.
• Multi-Chamber System for Multi-Layer Film Formation (多層膜成膜用マルチチャンバーシステム) Multi-chamber system for multi-layer film formation enabling continuous deposition of up to 5 layers without atmospheric exposure, designed for thin-film device R&D including thin-film solar cells.
• Compact Research Plasma Processing System (研究用小型プラズマ処理装置) Compact plasma processing system utilizing proprietary LIA technology for CVD and etching R&D on thin film and polymer materials, featuring automatic processes and data logging. Targeted at university and corporate research labs.
• Plasma Technology Consulting and Joint Development Services Consulting and contracted R&D services covering plasma and electromagnetic process technology investigations, process development, and plasma source customization. Targeted at next-generation industries including displays, thin-film solar cells, LEDs, and carbon materials.

Quantifiable outcome

• Significantly improved solar cell energy efficiency
• +2 more outcomes

Segments4 records

Ideal customer profiles4 records

Technology focussed Yes

API detail

Has API

No

API docs

API detail

Core technology

AI maturity

App detail

Feature4 records

Partnerships

Three partnerships are on record, tiered core.

• SCREEN Holdings (株式会社SCREENホールディングス)coreOthers · 1 September 2012EMD became a group company of SCREEN Holdings in September 2012. EMD operates as a subsidiary within the SCREEN Holdings group, located at the SCREEN Holdings Yasu facility. This provides EMD with group resources and market positioning in the semiconductor and display equipment industry.
• Osaka University (大阪大学)coreStrategic or Co-development Partner · 1 January 2000EMD co-developed the Low Inductance Antenna (LIA) technology with Osaka University. This joint development created the multi-antenna plasma generation method that is EMD's core proprietary technology. Osaka University is the origin of this plasma technology innovation.
• Japan Science and Technology Agency (JST/科学技術振興機構)coreStrategic or Co-development Partner · 1 January 2000JST provided EMD with priority licensing for plasma technology patents based on Pre-Venture事业 research results. EMD was selected for multiple JST programs including Pre-Venture事業, 独創的シーズ展開事業, A-STEP programs, and received various grants from JST-managed funds.

Scale indicators2 records

Recent moves7 records

Expansion highlights5 records

Broad incumbents

• ULVAC: Major Japanese vacuum and plasma equipment maker serving flat-panel display, semiconductor, and solar cell manufacturing. Comparable as a broad incumbent offering plasma deposition and sputtering systems that overlap with EMD's LIA applications at much larger scale.
• Lam Research: Global semiconductor equipment leader specializing in plasma etch and deposition technologies. Comparable as a broad incumbent with deep R&D into advanced plasma sources that could substitute for or replicate EMD's LIA capabilities at scale.
• Shibaura Mechatronics: Japanese equipment maker supplying plasma etching, CVD, and surface treatment systems to semiconductor and display manufacturers. Comparable as a broader incumbent whose plasma source portfolio intersects with EMD's LIA technology.
• Tokyo Electron: One of the largest Japanese semiconductor and flat-panel display equipment manufacturers, with extensive plasma etch and CVD product lines. Comparable as a broad incumbent whose plasma processing tools serve the same display and semiconductor customers as EMD.
• Applied Materials: Global leader in semiconductor and display manufacturing equipment, with extensive plasma-enhanced CVD and PVD product lines serving flat-panel display and thin-film solar fabs. Comparable as a broad incumbent whose deposition systems compete for the same end-market customers.

Direct peers

• SPP Technologies: Japanese manufacturer of plasma processing and thin-film deposition equipment used in semiconductor and display manufacturing. Directly comparable to EMD in plasma source technology, target applications, and Japanese customer base.
• Oxford Instruments (Plasma Technology): UK-based division selling plasma etch and deposition tools for research and production applications including photonics, MEMS, and advanced materials. Comparable to EMD as a specialist plasma equipment maker serving R&D customers with customization.
• Trion Technology: US-based plasma etch equipment supplier focused on specialty and R&D applications including photonics, MEMS, and compound semiconductors. Comparable to EMD as a smaller specialist competing in plasma processing for niche and research customers.
• Plasma-Therm: US-based supplier of plasma etch and deposition equipment for semiconductor, MEMS, and advanced packaging. Directly comparable to EMD as a specialist plasma equipment vendor focused on process innovation and custom tool design.
• Samco Inc: Japan-based maker of plasma CVD, plasma etching, and surface treatment equipment for semiconductor and thin-film R&D. Highly comparable to EMD as a small, specialized Japanese plasma equipment supplier targeting research and niche production customers.

Market position

Strengths5 records

Weaknesses5 records

Competitive moat3 records

Key risks6 records

Key highlights6 records

Customer concentration

Revenue estimate

Valuation estimate

Number of profiles

Profiles1 record

Funding overview

Funding rounds

Investors

Funding detail is available on the Subscription and Enterprise plan.Contact sales →

M&A

Investments

M&A and investment is available on the Subscription and Enterprise plan.Contact sales →

Frequently asked questions about EMD