CCR Technology GmbH

What CCR Technology GmbH does

CCR Technology GmbH is a privately-held German manufacturer of industrial RF plasma sources, founded in 1995 and headquartered in Troisdorf. The company invented and is the sole proprietor of COPRA Plasma Technology®, a platform built on 13.56 MHz inductively coupled plasma (ICP) RF excitation that the company claims delivers superior power efficiency, scalability and reliability compared to alternative plasma technologies. The product portfolio comprises four core source configurations — COPRA Round Sources, COPRA Linear Sources, COPRA Ring Sources, and COPRA Built-In Sources — a Faraday Cup measurement system for plasma diagnostics, custom-design variants across each family, and a turnkey Plasma Systems offering that is currently under construction. Every source variant is designed to operate with constant basic plasma parameters regardless of scaling in size or speed, enabling transfer of qualified processes from R&D to industrial production.

The company serves end users, original equipment manufacturers (OEMs) and research groups across eight primary markets: precision optics, solar, displays, storage media, semiconductor, architectural glass, wear and decorative coatings, and packaging. Target applications include plasma-enhanced chemical vapor deposition (PECVD) of silicon, metal oxides and nitrides, optical multilayer and AR coatings, OLED encapsulation and TCO layers, tunnel magnetoresistance (TMR) barriers, chemical and ion etching, low-E architectural glass coatings, hard and decorative coatings (DLC, oxides, nitrides), roll-to-roll barrier layers, plasma cleaning and activation, sputter and E-gun assist for PVD, and plasma-assisted layer deposition (PALD). With more than 1,500 units sold in more than 40 countries, CCR Technology is positioned as an established front-end component supplier in the global industrial plasma equipment supply chain.

The business model is a B2B enterprise field-sales motion, selling plasma source hardware directly to industrial end users, supplying OEMs that integrate COPRA sources into larger production systems, and serving academic and industrial research institutions. The company differentiates on technology rather than price and pairs hardware sales with a partnership-style transfer of technical know-how to support customer process integration. Pricing is not publicly disclosed and is custom per configuration. No revenue, funding, ownership, leadership, partnership or M&A information is disclosed in the public sources reviewed, indicating a founder-/closely-held, capital-light industrial operator with 25 years of continuous commercial activity.

Name

CCR Technology GmbH

Legal name

CCR GmbH

Website

https://ccrtechnology.de

Company type

Private

Founded year

1995

Operating status

Operating

Headcount range

11–50 employees

Short description

CCR Technology GmbH is a German manufacturer of COPRA RF-ICP plasma sources used for PECVD, PVD assist, etching, and surface activation, serving industrial OEMs, end users, and research groups across optics, solar, semiconductor, and coatings markets with 1,500+ units deployed in 40+ countries.

Ownership category

akta.pro rank

Product category

Industrial Plasma Equipment

NAICS

Capacitor, Resistor, Coil, Transformer, and Other Inductor Manufacturing (334416)

SIC

Electronic Coils, Transformers & Other Inductors (3677), Instruments For Meas & Testing Of Electricity & Elec Signals (3825)

akta.pro primary industry

Welding & Plasma Power Supplies (Industrial welders, cutting power sources) (IMAGADAI)

akta.pro secondary industry

Inductors & Coils (Power/RF/Chokes) (HDAHANAC)

Keywords

• RF plasma sources
• PECVD plasma technology
• Inductively coupled plasma
• Plasma etching systems
• PVD process assist

Headquarters

HQ city

Troisdorf

HQ country

Germany

HQ region

Europe

Offices1 record

Markets served

GTM type

B2B

Offering type

Hardware or Manufacturing

Cost components

Technology or R&D, Personnel, Operations, Supply Chain, Marketing or Sales

Revenue model

1. COPRA Plasma Hardware Sales: Sale of COPRA Plasma Sources including Round Sources, Linear Sources, Ring Sources, Built In Sources, and Faraday Cup measurement systems. Hardware products are sold to industrial customers in precision optics, solar, semiconductor, and coatings markets.

Go-to-market motion1 record

Distribution channels3 records

Marketing channels3 records

Core offering

CCR Technology GmbH develops and manufactures COPRA RF-ICP plasma sources based on a proprietary 13.56 MHz inductively coupled plasma excitation method. The hardware portfolio includes Round, Linear, Ring, and Built-In plasma sources, a Faraday Cup measurement system, and complete plasma systems used for plasma-enhanced chemical vapor deposition (PECVD), PVD assist (sputter and e-beam evaporation), reactive and physical etching, surface cleaning, activation, and plasma-assisted layer deposition (PALD) in industrial production environments.

Product overview

CCR Technology GmbH offers the COPRA Plasma Technology, a unified platform of RF plasma sources based on 13.56 MHz inductively coupled plasma (ICP) excitation. The product portfolio consists of four main plasma source types (Round Sources, Linear Sources, Ring Sources, and Built-In Sources), a Faraday Cup measurement system, and complete Plasma Systems. All products share the same fundamental RF plasma technology and are designed for industrial applications including PECVD, PVD Assist, Etching, and surface cleaning/activation processes. The technology serves markets in precision optics, solar, displays, storage media, semiconductor, architectural glass, wear coatings, and packaging.

Differentiator

Problem solved

Functional benefit

Brands

• COPRA Plasma Technology: A plasma technology based on inductively coupled 13.56 MHz RF plasma excitation, superior in power efficiency, scalability and reliability. Used for PECVD of silicon, metal oxides and nitrides, optical filter stacks, protective and wear coatings, and PVD process assistance including Sputter Assist and E-Gun Assist.

Products and services

• COPRA Round Sources Round substrate RF plasma sources in flange sizes from DN160 to DN501, available in multiple configurations (CF-GM, X-GR, X-GM, CF-GRPE, ISO-K-EGRPE), used in PECVD, etching, and surface treatment processes.
• COPRA Linear Sources Linear RF plasma sources ranging from LS360x200 to LS1300x202 with GRPE and DPRPE configurations, designed for large-area processing applications such as architectural glass and roll-to-roll coatings.
• COPRA Ring Sources Ring-shaped RF plasma sources in sizes from RS400 to RS1000x402 with DPR configuration, intended for cylindrical coating and rotational substrate processing.
• COPRA Built In Sources Integrated RF plasma sources designed to be embedded into OEM equipment, available in IS201 to IS1100x250 sizes with various configurations (G, EG, IR, PE) for equipment manufacturer integration.
• Faraday Cup System Measurement instrument for plasma diagnostics and characterization, used to evaluate ion flux in RF plasma processes alongside COPRA plasma sources.

Quantifiable outcome

• Over 1500 COPRA plasma source units sold globally
• +1 more outcomes

Segments8 records

Ideal customer profiles2 records

Technology focussed Yes

API detail

Has API

No

API docs

API detail

Core technology

AI maturity

App detail

Feature1 record

Scale indicators3 records

Recent moves5 records

Expansion highlights4 records

Direct peers

• Tantec A/S: European manufacturer of plasma and corona surface treatment systems. Comparable in scale and product category to CCR, particularly for surface activation and cleaning applications.
• Plasma-Therm LLC: US-based manufacturer of plasma etch and deposition equipment serving semiconductor, photonics, and research markets. Directly comparable product offering (ICP plasma sources, PECVD, reactive ion etching).
• PVA TePla AG: German manufacturer of plasma-based systems for semiconductor, optics, and surface treatment applications. Closest geographic and product peer, serving many of the same PECVD, etching, and surface activation use cases as CCR's COPRA platform.
• Angstrom Sciences: Manufacturer of sputter sources and plasma source components for thin-film deposition. Comparable as a specialty plasma source supplier integrated into larger OEM and research deposition systems.
• Diener electronic GmbH + Co. KG: German manufacturer of low-pressure and atmospheric plasma surface treatment systems. Directly comparable to CCR on plasma cleaning, activation, and PECVD for industrial/research customers.

Emerging players

• Henniker Plasma: UK-based manufacturer of plasma surface treatment and cleaning equipment. Comparable niche player focused on plasma activation and cleaning — overlapping use cases with CCR's Cleaning & Activation offering.

Broad incumbents

• MKS Instruments (ENI brand): Through its ENI RF power business, MKS supplies RF generators that are core to industrial plasma sources — a direct upstream comparable to the RF generator half of CCR's COPRA technology, but at vastly larger scale and broader portfolio.
• Advanced Energy Industries: Global supplier of precision power conversion, measurement, and control solutions including RF generators for plasma applications. Comparable as a broader, financially larger incumbent addressing overlapping plasma/RF customer needs.
• Comet Group: Swiss manufacturer of RF power delivery, plasma control, and X-ray systems for semiconductor and industrial markets. Comparable as a broader incumbent offering RF generators and plasma subsystems to OEMs in similar end-markets.
• TRUMPF Hüttinger: German manufacturer of RF generators and plasma excitation power supplies for industrial coating, solar, and semiconductor applications. Closest broad incumbent comparable to the RF generator side of CCR's COPRA architecture.

Market position

Strengths5 records

Weaknesses5 records

Competitive moat4 records

Key risks6 records

Key highlights6 records

Customer concentration

• LinkedInlinkedin.com/company/ccr-technology-gmbh

Revenue estimate

Valuation estimate

Number of profiles

Funding overview

Funding rounds

Investors

Funding detail is available on the Subscription and Enterprise plan.Contact sales →

M&A

Investments

M&A and investment is available on the Subscription and Enterprise plan.Contact sales →

Frequently asked questions about CCR Technology GmbH