What XYALIS does

XYALIS is a privately held French Electronic Design Automation (EDA) software vendor specializing in Mask Data Preparation (MDP), Dummy Filling for Chemical-Mechanical Planarization (CMP), and Layout Manipulation for semiconductor design teams, mask shops, and foundries. Founded in 1998 and headquartered in Grenoble, France, the company develops the GOTseries tool suite built around a proprietary GOT (GDSII & OASIS TOOL) data representation engine designed to manipulate the largest GDSII and OASIS layout files using minimal memory and disk resources. Core products include GOTmuch (MPW/multi-chip assembly), GOTframe (reticle frame generation including single-pass 3D), GOTmask (mask set editor), GOTcross (MPW placement), GOTfiller and GOTstyle (dummy fill/CMP), and a Layout Manipulation Toolbox spanning GOTcheck, GOTmerge, GOTreplace, GOTpop, GOTdiff, GOTviewer, GOTconverters, and other utilities supporting GDSII, OASIS, OASIS.MASK, CIF, MEBES, and PostScript formats.

The company sells directly to enterprise customers via a sales-led motion with multi-year enterprise contracts (no published pricing), complemented by EDA consulting, training, and ongoing support services. Distribution is direct through a French headquarters and a San Jose, California subsidiary opened in 2008 to serve North America. XYALIS maintains active SEMI standards participation (P10, P39, P44, P45), holds granted US and European patents on geometry-based layout database comparison, and routinely collaborates with large semiconductor manufacturers on advanced-node tool qualification (e.g., STMicroelectronics, KALRAY, MOSIS, DelfMEMS). Beyond commercial products, XYALIS is engaged in the EU Defence Fund Hartroid project for Hardware Trojan identification in large-scale integrated circuits, opened in December 2023.

XYALIS operates as a small boutique vendor (1-10 employees) generating revenue through one-time software licenses, recurring support, and professional services. Its go-to-market is anchored on recurring presence at major EDA and lithography conferences (DAC, SPIE Photomask/BACUS, SPIE EUVL, JEVeC), technical white papers, and direct enterprise sales, with no public funding, acquisitions, or IPO activity on record.

Name

XYALIS

Legal name

XYALIS sarl

Website

https://xyalis.com

Company type

Private

Founded year

1998

Operating status

Operating

Headcount range

1–10 employees

Short description

XYALIS is a French EDA software vendor founded in 1998 that builds Mask Data Preparation, Dummy Filling, and Layout Manipulation tools (GOTseries) for semiconductor design teams, mask shops, and foundries, based in Grenoble with a San Jose office.

Ownership category

akta.pro rank

Product category

Electronic Design Automation Software

akta.pro primary industry

EDA Software Platforms (Digital Implementation, Verification & Signoff) (HDAHAFAA)

akta.pro secondary industry

System-Level, Multi-Physics & Package/PCB Co-Design (EDA) (HDAHAFAD)

Keywords

• Mask data preparation
• Electronic design automation
• Dummy fill CMP
• Layout finishing
• GDSII OASIS tools

Headquarters

HQ city

Grenoble

HQ country

France

HQ region

Europe

Offices2 records

Markets served

GTM type

B2B

Offering type

Software

Cost components

Personnel, Technology or R&D, Marketing or Sales, Operations, Infrastructure

Revenue model

1. EDA Software Licensing: XYALIS generates revenue primarily through licensing its GOTsuite of EDA software tools. The software includes tools for Mask Data Preparation, Dummy Filling, and Layout Manipulation. Tools are available via command line and GUI, with different product editions (GOT vs GT generations). Sales are direct to semiconductor design teams, mask shops, and fabs.
2. EDA Professional Services: XYALIS offers EDA consulting, training, and support services to complement its software tools. These professional services help customers integrate XYALIS tools into their existing flows and optimize mask data preparation workflows.
3. Software Support and Maintenance: The company provides ongoing EDA support services alongside software licensing, helping customers maintain and optimize their mask data preparation flows with production-proven engines.

Pricing tiers

Go-to-market motion2 records

Distribution channels1 record

Marketing channels5 records

Core offering

XYALIS develops and licenses Electronic Design Automation (EDA) software tools for the semiconductor industry, focused on Mask Data Preparation (MDP), Dummy Filling for CMP optimization, and Layout Manipulation. Its GOTsuite and GTsuite products handle GDSII, OASIS, OASIS.MASK, CIF, and MEBES layout files, enabling multi-project wafer assembly, reticle frame generation, mask set creation, and post-layout verification for fabs, mask shops, and design houses.

Product overview

XYALIS is an Electronic Design Automation (EDA) company offering a comprehensive suite of mask data preparation (MDP) and layout finishing tools. The product portfolio consists of the GOTseries tools (current generation) and GTseries tools (legacy generation), organized into three core solution areas: Mask Data Preparation (GOTmuch, GOTframe, GOTmask, GOTcross, GOTfiller), Dummy Filling (GOTstyle, GOTfiller), and Layout Manipulation Toolbox (GOTcheck, GOTmerge, GOTreplace, GOTlayer, GOTpick-cell, GOTviewer, GOTomat, GOTfig, GOTposter, GOTconverters, GOTpop, GOTdiff). The GOTseries represents the redesigned next-generation tools addressing challenges of advanced technology nodes including 3D-ICs, stitching, MPWs, multi-patterning, and density management. The tools handle GDSII, OASIS, CIF, PostScript, and MEBES formats. XYALIS also provides EDA Consulting, Training, and Support services. The company was founded in 1998 and celebrated 26 years of operation in 2024.

Differentiator

Problem solved

Functional benefit

Products and services

• GOTmuch Multi Chip Assembly editor for creating multi-chip assemblies and Multi-Project Wafers (MPWs) or shuttles/pizza masks. Maximizes chip placement, minimizes wafer count, performs metal fill at reticle level, and generates documentation. Targeted at semiconductor design teams and MPW service providers.
• GOTframe Frame Assembly Editor for generating complex reticles and frames for chip manufacturing, with single-pass frame generation capability for multi-layer 3D circuits. Targeted at fabs, mask shops, and R&D teams.
• GOTmask Mask Set Editor for intuitive and automated mask set creation and editing, supporting SEMI standards including SEMI P10 order forms. Targeted at mask shops and fabs.
• GOTcross Multi Project Wafer Placement engine providing production-aware chip placement that minimizes production costs for MPW assembly. Targeted at foundries and MPW service providers.
• GOTfiller Dummy filling tool at reticle level that flattens surface before Chemical-Mechanical Planarization (CMP) and increases manufacturing yield. Targeted at fabs and design teams.
• GOTstyle 3rd Generation Dummy Fill Engine for high-speed parallel processing at chip, reticle, or wafer level with design-driven dummy filling capabilities. Targeted at semiconductor design teams needing CMP optimization.
• GOTcheck Databases Checking Tool for GDSII, OASIS, and MEBES file verification to ensure data integrity before tapeout. Targeted at design teams and mask shops.
• GOTmerge Databases Merging Tool for combining multiple layout databases into single GDSII or OASIS files. Targeted at design teams performing chip assembly.
• GOTreplace Cell Replacing Tool for swapping library cells in layout databases, enabling quick cell substitution in GDSII/OASIS files. Targeted at design teams and mask shops.
• GOTlayer Layer Manipulation Tool for managing layout layers in GDSII and OASIS files. Targeted at design teams needing fine-grained layer control.
• GOTpick-cell Cell Extraction Tool for extracting cells from OASIS and GDSII layouts. Targeted at design teams and mask shops.
• GOTviewer Layout Display Tool for viewing OASIS and GDSII layout files with interactive visualization. Targeted at design engineers and layout analysts.
• GOTomat OASIS Mask Converter for converting between OASIS and other layout formats. Targeted at fabs and mask shops needing format interoperability.
• GOTfig PNG Graphic Generator for creating image representations of layout databases from jobdeck files. Targeted at design teams needing visual documentation.
• GOTposter

Quantifiable outcome

• OASIS format achieves compression ratios of approximately 10X compared to GDSII for mask prep and layout finishing tasks at 65nm and 45nm nodes
• +4 more outcomes

Named customers4 records

Segments3 records

Ideal customer profiles3 records

Technology focussed Yes

API detail

Has API

No

API docs

API detail

Core technology

AI maturity

App detail

Integration2 records

Feature8 records

Partnerships

Five partnerships are on record, tiered core and minor.

• STMicroelectronicscoreStrategic or Co-development Partner · 26 September 2022XYALIS collaborated with STMicroelectronics to develop a novel single-pass frame generation methodology for multi-layer 3D circuits. This collaboration produced a technical paper presented at SPIE Photomask Technology Conference 2022. The methodology uses XYALIS's GOTframe tool with constraint-satisfaction algorithms for alignment, overlapping, and mirroring constraints in 3D chip frames.
• KALRAYcoreStrategic or Co-development PartnerXYALIS collaborated with KALRAY to achieve advanced dummy fill for KALRAY's MPPA-256 manycore processor at 28nm. XYALIS GTstyle successfully addressed complex process rules. KALRAY also contributed to validation of XYALIS layout finishing flow for a 3-billion-transistor, 256-core processor.
• SII NanoTechnologycoreStrategic or Co-development PartnerXYALIS and SII NanoTechnology announced a strategic cooperation agreement in January 2011 to broaden availability of photomask verification solutions. SII NanoTechnology is a leader in Photomask Verification software. The partnership combined XYALIS's MDP software with SII NanoTechnology's verification tools.
• Toppan Photomasks France SASminorStrategic or Co-development PartnerToppan Photomasks France SAS participated with XYALIS in the European MEDEA+ CRYSTAL Project ('DFM Photomasks inputs for EDA workflow' Task Force). This was part of a consortium including universities and SMEs working on design-for-manufacturing photomask inputs for EDA workflows.
• ARNANOminorStrategic or Co-development PartnerXYALIS supported the Fahrenheit 2451 Nanoforms project by ARNANO, combining art and technology for long-term data preservation on synthetic sapphire or glass disks. XYALIS contributed its GTnano technology for encoding data on Nanoform disks.

Scale indicators3 records

Recent moves6 records

Expansion highlights5 records

Direct peers

• D2S (NuFlare Technology): D2S is a direct competitor in Mask Data Preparation, specializing in curvilinear masks and GPU-accelerated MDP workflows. Acquired by NuFlare Technology in 2022, it competes head-to-head with XYALIS's GOTsuite for mask data prep customers.
• SII NanoTechnology (Hitachi High-Tech): SII NanoTechnology is a leader in photomask verification software and a documented XYALIS partner. Its verification tools overlap with XYALIS's MDP offerings, making it both a competitor and ecosystem partner.

Broad incumbents

• Cadence Design Systems: Cadence offers a comprehensive EDA suite (Innovus, Voltus) that includes mask synthesis and layout finishing capabilities adjacent to XYALIS's MDP tools. As the largest EDA incumbent, Cadence competes for the same design-team wallet share.
• Synopsys: Synopsys's IC Compiler and physical verification flow include MDP and mask data preparation features, positioning it as a broad incumbent competitor whose integrated flows can displace point-tool vendors like XYALIS.
• Siemens EDA: Siemens EDA (formerly Mentor Graphics) offers Calibre nmDRC and mask rule checking tools that overlap with XYALIS's mask verification and MDP offerings, making it a broad incumbent alternative for mask-related design finishing.
• ASML: ASML's Brion computational lithography division provides mask synthesis and OPC capabilities that overlap with XYALIS's MDP and layout finishing tools. As a lithography leader, ASML is a broad incumbent with adjacent offerings.
• KLA Corporation: KLA provides mask inspection and process control tools that interface with XYALIS's MDP workflows (documented collaboration partner). Its broader portfolio makes it an adjacent incumbent in the mask data ecosystem.
• NuFlare Technology: NuFlare Technology is a leading mask writer and EDA vendor that acquired D2S in 2022, consolidating its presence in MDP. It competes with XYALIS as a broader incumbent in mask writing and data preparation equipment/software.

Others

• Toppan Photomasks: Toppan Photomasks is a major mask shop customer and consortium partner of XYALIS (MEDEA+ CRYSTAL project). As a buyer of MDP software, Toppan represents the customer-side of the mask data ecosystem rather than a direct competitor.
• Photronics: Photronics is one of the world's largest merchant photomask manufacturers and a typical buyer of MDP software from vendors like XYALIS. It represents the mask-shop customer base rather than a direct software competitor.

Market position

Strengths5 records

Weaknesses5 records

Competitive moat4 records

Key risks6 records

Key highlights7 records

Customer concentration

• LinkedInlinkedin.com/company/xyalis?trk=fc_badge

Revenue estimate

Valuation estimate

Number of profiles

Profiles1 record

Funding overview

Funding rounds

Investors

Funding detail is available on the Subscription and Enterprise plan.Contact sales →

M&A

Investments

M&A and investment is available on the Subscription and Enterprise plan.Contact sales →

Frequently asked questions about XYALIS