What Kemlab does

KemLab Inc. is a privately held, US-based specialty chemicals manufacturer founded in 2013 and headquartered in Woburn, Massachusetts. The company designs, formulates, and produces photoresists and ancillary chemicals used in photolithographic patterning for the microelectronics industry, serving production, pilot, and research customers. Its portfolio spans negative epoxy photoresists (SQ Series SU-8 variants including Standard, QuickDry, MicroCoat, and OptiCoat; HARE SQ; NPR), positive photoresists (KL5300, KL6000, KL7000 PFAS-Free), lift-off and image-reversal resists (APOL-LO 3200, KL IR), advanced packaging resists (K-PRO), PMMA-based e-beam resists (HARP series), and complementary ancillaries such as TMAH 0.26N developer, SQ SU-8 developer, MIBK/IPA developers, edge bead removers, protective coatings, and spin-on primers. ISO 9001:2015 certification and a cleanroom-equipped Woburn facility underpin quality claims of improved particle counts, lower microbubble content, and better lot-to-lot consistency versus legacy SU-8 products.

KemLab operates a hybrid direct-and-channel go-to-market: sample sizes (100ml-1L) transact via an online storefront for domestic US buyers, while standard production volumes (4L+) require quote requests through [email protected]. Eight named international distributors — ELEXAN Scientific, Transene Electronic Chemicals, Capitol Scientific, NM Tech, Gas Technologies & Chemicals, JinHou Electronic, Darwin Microfluidics, and AURA Innovative Technologies — extend reach into West Coast US, East Coast US, Texas, South Korea, Israel, Taiwan/Southeast Asia, France/Europe, and India respectively. End-use customer segments include MEMS and microfluidics fabrication, semiconductor/IC manufacturing, advanced packaging (TSV, bumping, wafer-level packaging), compound semiconductors and LED production, electron beam lithography (T-gates, X-ray LIGA, wafer thinning), and optical/photonics device manufacturing. Pricing is quote-based for production volumes with a 30-day quote validity and 1-3 week manufacturing lead times, supplemented by custom formulation services for specific application parameters. Manufacturing, R&D, and technical support appear concentrated at the Woburn site; the company's General Manager is Jeremy Golden.

Name

Kemlab

Legal name

KemLab Inc.

Website

https://kemlab.com

Company type

Private

Founded year

2013

Operating status

Operating

Headcount range

1–10 employees

Short description

KemLab Inc. is a Woburn, Massachusetts-based specialty chemical manufacturer that formulates and sells photoresists and ancillary chemicals for MEMS, semiconductor, advanced packaging, compound semiconductor, e-beam, and photonics fabrication customers worldwide via direct sales and global distributors.

Ownership category

akta.pro rank

Product category

Electronic Chemicals

NAICS

Photographic Film, Paper, Plate, Chemical, and Copy Toner Manufacturing (325992)

SIC

Miscellaneous Chemical Products (2890)

akta.pro primary industry

Photoresists & Lithography Materials (Resists, Developers, Strippers) (IMAEAKAB)

akta.pro secondary industry

Photoresists & Lithography Chemicals (Resists/Developers/Anti-Reflective Coatings) (HDAHAGAE)

Keywords

• Photoresist manufacturing
• Microelectronics chemicals
• Photolithography materials
• Epoxy photoresists
• MEMS fabrication supplies

Headquarters

HQ city

Woburn

HQ country

United States

HQ region

North America

Offices5 records

Markets served

GTM type

B2B

Offering type

Hardware or Manufacturing

Cost components

Personnel, Operations, Technology or R&D, Supply Chain, Marketing or Sales, Infrastructure

Revenue model

1. Photoresist Product Sales: One-time product sales of photoresists including SQ Series, KL Series, K-PRO, APOL-LO, HARP PMMA resists. Products sold in standard sizes (100ml, 500ml, 1L, 4L) and custom formulations.
2. Ancillary Chemicals Sales: Sales of developer solutions (TMAH 0.26N, SQ SU-8 Developer, MIBK/IPA), edge bead removers, protective surface coatings, spin-on primers, and photoresist removers.
3. Custom Formulation Services: Resist formulation support and customization services for specific applications, including modifying commercially available photoresists and optimizing parameters such as film thickness, optical absorbance, photospeed, and lithographic profiles.

Pricing tiers

Go-to-market motion2 records

Distribution channels10 records

Marketing channels5 records

Core offering

KemLab manufactures and sells high-purity photoresists (positive, negative, image reversal, lift-off, and e-beam) and ancillary chemicals (developers, edge bead removers, protective coatings, primers, removers) for photolithography processes used in microelectronics, MEMS, microfluidics, advanced packaging, and semiconductor manufacturing. The company operates an ISO 9001:2015 certified production facility in Woburn, Massachusetts, and also offers custom photoresist formulation services and technical photolithography expertise.

Product overview

KemLab is a US-based photoresist manufacturing company and photolithography research and innovation company headquartered in Woburn, Massachusetts. The company offers a diverse portfolio of positive and negative photoresists for the electronics industry, serving production, pilot, and research environments. The core product lines include: SQ Series SU-8 Epoxy Photoresists (including Standard, QuickDry, MicroCoat, and OptiCoat variants) for MEMS, microfluidics, and microelectronics applications; HARP PMMA and Copolymer e-Beam Resists for high-resolution direct write electron beam lithography; Positive Photoresists (KL5300, KL6000, KL7000 PFAS-Free series) for general purpose to thick film applications; Negative Photoresists (APOL-LO 3200, NPR, KL IR Image Reversal series) for lift-off, vertical profile, and dual-tone applications; and K-PRO Advanced Packaging Resists for wafer level packaging, TSV, bumping, and plating. The product portfolio is supported by a comprehensive line of ancillaries including developers (TMAH, SQ SU-8, MIBK/IPA), edge bead removers, protective surface coatings, spin-on primers, and photoresist removers. KemLab also provides photolithography services including manufacturing, formulation support, and technical expertise. All products are manufactured under ISO 9001:2015 certification.

Differentiator

Problem solved

Functional benefit

Brands

• HARE SQ: High Aspect Ratio negative tone epoxy photoresist for MEMS and microfluidics applications
• K-PRO
• APOL-LO
• NPR
• KL IR
• HARP
• KL7000
• KL5300
• KL6000
• SQ Series

Products and services

• SQ Series SU-8 Epoxy Photoresists Negative tone epoxy photoresist line for polymeric MEMS, microfluidics, micromachining, and microelectronics applications. Available in Standard, QuickDry, MicroCoat, and OptiCoat variants with film thicknesses from 0.05 to 200 microns. Sensitive to NUV, i-line, and broadband wavelengths. Designed as a plug-and-play replacement for legacy SU-8 products with improved optical transparency, fewer particles, and better filterability.
• HARE SQ High Aspect Ratio Negative Epoxy Photoresist Negative tone epoxy photoresist with high aspect ratio capabilities for permanent MEMS and microfluidics applications. Film thickness 2-100 microns with vertical sidewalls.
• HARP PMMA and Copolymer e-Beam Resists High-resolution direct write e-beam lithography resists including 1000 HARP (highest molecular weight, competes with 950 PMMA), 500 HARP (mid-range molecular weight, faster throughput, competes with 495 PMMA), and HARP-C copolymer (MMA/MAA for multi-layer T-gate processes). Manufactured in safe solvents for T-gate manufacture, X-ray LIGA, and wafer thinning.
• KL5300 Series Positive Photoresist General purpose positive photoresist for i-Line, g-Line and broadband applications. Film thickness 0.25-2.5 microns with resolution of 0.55 micrometers. Uses 0.26N TMAH developers.
• KL6000 Series Positive Photoresist General purpose thick positive photoresist for i-Line, g-Line and broadband applications. Covers 2.5-12 micrometers in single coat. High sensitivity and throughput with no post-exposure bake required.
• KL7000 Series PFAS-Free Positive Photoresist PFAS-free and fluorine-free positive photoresist for i-line, g-line and broadband applications. Single coat coverage 0.15-3.0 micrometers. Resolution 0.55 micrometer dense line/space and 0.40 micrometer isolated line. Qualified replacement for S1800 and AZ1500 series.
• APOL-LO 3200 Hi-Res Negative Lift-Off Photoresist Negative tone advanced photoresist with lift-off profile for i-Line and broadband applications. Film thickness 2-10+ micrometers with improved resolution and wider process latitude. Drop-in competitor to AZ nLOF 2020, 2035, and 2070.
• NPR Negative Photoresist with Vertical Profile Negative tone novolac photoresist designed for electroplating, metal deposition, TSV, and RIE etch. Single coat film thickness up to 20 micrometers with vertical sidewalls and high aspect ratios. Thermally stable up to 130°C.
• KL IR Image Reversal Photoresist Image reversal photoresist series usable as either positive or negative tone in i-line, g-line and broadband applications. KL IR LO 15 designed for lift-off profiles; KL IR 15 for straight profiles. Designed as a replacement for AZ 5214E.
• K-PRO Advanced Packaging Thick Positive Photoresist Advanced packaging positive resist for i-line, g-line and broadband applications. Compatible with plating metals including copper, pure tin, and nickel. Film thickness 5-25 micrometers in single coat, up to 50 microns double-coat. Used for advanced wafer level packaging, MEMS, and 3D photolithography.
• TMAH 0.26N Developer General purpose, surfactant-free developer. Industry standard for advanced IC production, semiconductors, flat panel displays, and printed circuit boards. Drop-in replacement for AZ 300 MIF developer.
• SQ SU-8 Developer Solvent-based developer for SQ Series SU-8 epoxy photoresists. Provides clean development with vertical profiles and no line edge roughness. Compatible with legacy SU-8 resists and serves as a direct replacement for SU-8 PGMEA developer.
• MIBK/IPA Developer Developer for high resolution PMMA and copolymer resists. MIBK/IPA 1:1 ratio for high resolution and fast development; MIBK/IPA 1:3 ratio for highest resolution and slower development. Compatible with spray and immersion processes.
• KL EdgeClean Edge Bead Remover 1000 Universal edge bead remover for removal of edge beads formed during spin coat processes. Compatible with PMGI, lift-off resists, HARP PMMA, SQ SU-8, g-Line, i-Line and DUV resists. Drop-in replacement for EBR PG.
• KL Spin-On Primer 80/20 Blend of 80% PM Acetate and 20% HMDS for increased adhesion to silicon, oxides, nitrides and other surfaces.
• PSC Protective Surface Coatings (PSC-1003 and PSC-1010) Non-imageable wafer surface protection for use during chemical or mechanical processes in microelectronic fabrication. PSC-1010 is a drop-in replacement for AZ P4K-AP.
• KL Photoresist Remover NMP solvent-based resist remover for removing photoresist materials.
• KL Photolithography Services and Custom Formulation Professional photolithography services including photoresist manufacturing, formulation support, customization, and technical expertise in advanced packaging, MEMS, ICs, metal lift-off, compound semiconductors, LED, image reversal, diffraction gratings, and sensors. Includes custom resist formulation support modifying commercially available photoresists and optimizing parameters such as film thickness, optical absorbance, photospeed, and lithographic profiles.

Quantifiable outcome

• Film thickness range 2-200 microns achievable with SQ Series
• +2 more outcomes

Segments6 records

Ideal customer profiles6 records

Technology focussed Yes

API detail

Has API

No

API docs

API detail

Core technology

AI maturity

App detail

Feature6 records

Partnerships

Two partnerships are on record, tiered minor.

• SEMIminorOthersKemLab is a member of SEMI, the global industry association connecting member companies across the semiconductor and electronics design and manufacturing supply chain.
• IMAPSminorOthersKemLab is a member of IMAPS (International Microelectronics and Packaging Society), supporting the microelectronics packaging and assembly community.

Scale indicators3 records

Recent moves6 records

Expansion highlights5 records

Direct peers

• Allresist GmbH: Germany-based specialty photoresist manufacturer with comparable size, breadth (positive, negative, e-beam, and specialty resists), and a similar specialty/niche focus rather than commodity scale. A natural size-and-strategy peer for KemLab in the European and global research/MEMS segments.
• Transene Company: US-based manufacturer of electronic chemicals and photoresists, also a KemLab distributor. Competes in similar niche electronic-chemicals markets with comparable customer base in research, MEMS, and small-scale semiconductor production.
• MicroChem Corp (Nippon Kayaku): Original developer and leading supplier of SU-8 epoxy photoresist, the legacy chemistry that KemLab's SQ Series directly targets as a cleaner, more consistent plug-and-play alternative. Most direct competitor in MEMS and microfluidics epoxy resists.
• AZ Electronic Materials (Merck KGaA): Supplies the AZ nLOF, AZ 5214E, AZ 1500, AZ 300 MIF, and AZ P4K-AP product families that KemLab explicitly positions its APOL-LO, KL IR, KL7000, KL5300, and ancillaries as drop-in replacements for. Closest product-for-product direct competitor across positive, negative, lift-off, and image-reversal chemistries.

Emerging players

• DJ Devcorp: Small specialty chemical supplier focused on electronic and photoresist materials, comparable in scale and niche positioning to KemLab. Both compete for the long tail of research and pilot-line photoresist demand not served by the major incumbents.

Others

• Süss MicroTec: Supplies photolithography processing equipment and complementary process chemicals used in the same customer workflows (MEMS, advanced packaging, compound semiconductors). Not a direct resist competitor but a complementary ecosystem participant whose installed base influences KemLab's addressable market.

Broad incumbents

• JSR Corporation: One of the global 'Big Four' photoresist suppliers (with Shin-Etsu, TOK, Fujifilm) controlling the majority of advanced-node semiconductor photoresist supply. Competes with KemLab indirectly in advanced packaging and resists for IC manufacturing, but at vastly larger scale and scope.
• Tokyo Ohka Kogyo (TOK): Major Japanese photoresist manufacturer with deep presence in positive, negative, and packaging resists. Comparable indirectly to KemLab across most product lines but at incumbent scale, especially in semiconductor production.
• Shin-Etsu Chemical: Global photoresist leader with broad coverage across positive, negative, and chemically amplified resists for semiconductor and advanced packaging. Indirect competitor where KemLab targets second-source qualifications for fabs seeking supply diversification.
• Fujifilm Electronic Materials: Established supplier of photoresists, developers, and ancillaries for semiconductor, MEMS, and display applications. Overlaps with KemLab across positive resists, developers, and ancillaries but serves high-volume production customers that KemLab does not yet reach.

Market position

Strengths5 records

Weaknesses5 records

Competitive moat4 records

Key risks7 records

Key highlights7 records

Customer concentration

• Xx.com/kemlabthinks
• LinkedInlinkedin.com/company/kemlab

Compliance1 record

Revenue estimate

Valuation estimate

Number of profiles

Profiles1 record

Funding overview

Funding rounds1 record

Investors

Funding detail is available on the Subscription and Enterprise plan.Contact sales →

M&A

Investments

M&A and investment is available on the Subscription and Enterprise plan.Contact sales →

Frequently asked questions about Kemlab