OAI

What OAI does

OAI is a privately held Silicon Valley precision-equipment manufacturer, founded in the mid-1970s and headquartered in Milpitas, California, that designs and builds photolithography, UV exposure and UV/electrical measurement instrumentation for the semiconductor, MEMS, microfluidics, advanced packaging, large-area display, solar/PV and UV-measurement industries. Its core technology platform is a modular mask-aligner architecture spanning tabletop R&D units (Model 200/200IR/200E/212) through semi-automatic (Model 800E) and fully automated production systems (Model 6000/6000A-MC/6020), underpinned by proprietary Advanced Beam Optics with ±3% beam uniformity, an optical integrator maintaining ±2% intensity control, and advanced pattern recognition software for submicron frontside and backside alignment. The product portfolio extends beyond mask aligners into stand-alone UV light sources (Model 30/30E/30L/32 UV LED), UV light and energy meters with detachable probes (Model 308/308T/656/659), resistivity meters (Hiresta UX, Loresta FX, Loresta GX II), TriSOL™ Class AAA solar simulators, integrated I-V test systems, automated in-line I-V/AOI/EL sorting systems, an AML Wafer Bonder, and a recently acquired Radiation Power Systems product line of mercury and xenon arc lamp power supplies.

The business model is anchored on one-time capital-equipment sales (mask aligners, UV sources, solar simulators, I-V testers and meters) complemented by recurring NIST-traceable calibration services for UV light measurement instruments — an aftermarket stream tied to the installed base of thousands of systems worldwide, with paid rush tiers (48-hour at $200/meter and 24-hour at double calibration cost). Pricing is quote-based across all major product lines, with dedicated online forms for Product, Calibration, Resistivity and Calibration-Order requests. Distribution runs through direct worldwide field and inside sales, a U.S. toll-free line, structured online quote capture, and a flagship co-sell partnership with C&D Semiconductors for the integrated P9000 / OAI 6000 Lithography Cell. Customer end-markets include tier-1 semiconductor fabs and equipment vendors (TSMC, ASML, Applied Materials, Infineon, Texas Instruments, Qorvo, Veeco, ULVAC, Onto Innovation, Chipbond), technology and life-sciences majors (Google, Keysight, Corning, Medtronic), and academic institutions (MIT, UC Berkeley, SFU). The company is a long-time SEMI member and founding member of the MEMS & Sensors Industry Group, and operates an on-site Calibration Laboratory in Milpitas that supports its aftermarket service offering.

Name

OAI

Legal name

OAI

Website

https://oainet.com

Company type

Private

Founded year

1975

Operating status

Operating

Headcount range

1–10 employees

Short description

OAI is a privately held, Milpitas-based manufacturer of precision photolithography mask aligners, UV exposure and UV measurement instruments, solar simulators and I-V testers, serving semiconductor fabs, MEMS, microfluidics, advanced packaging and PV/solar manufacturers worldwide.

Ownership category

akta.pro rank

Headquarters

HQ city

Milpitas

HQ country

United States

HQ region

North America

Offices3 records

Markets served

GTM type

B2B

Offering type

Hardware or Manufacturing

Cost components

Personnel, Operations, Technology or R&D, Supply Chain, Marketing or Sales, Infrastructure

Revenue model

1. Capital Equipment Sales — Mask Aligners: One-time sale of precision mask aligner capital equipment including Model 200/200IR/212/800E/6000/6020 tabletop, semi-automatic, and automated production mask aligners for R&D and high-volume semiconductor production.
2. Capital Equipment Sales — UV Light Sources & Exposure Systems: One-time sale of UV light sources (Model 30, 30E, 30L, 32 UV LED), flood exposure systems (Model 2000AF/SM, 2012AF/SM), and large area exposure systems (Model 6020).
3. Capital Equipment Sales — Solar / PV: One-time sale of TriSOL Class AAA, CPV, Multijunction, Large Area Solar Simulators, I-V Test Systems, I-V/AOI/EL Sorting Systems, EL Imaging Testers, and Single Long Pulse Test Systems.
4. Capital Equipment Sales — UV Meters & Resistivity Meters: One-time sale of Model 308, 308T, 656, 659 UV light/energy meters; Loresta FX, Loresta GX II low-resistivity meters; Hiresta UX high-resistivity meter; plus a full family of probes.
5. Calibration Services — Recurring: Recurring NIST-traceable calibration services for UV measurement instruments. Standard 10-business-day turnaround; paid rush tiers (48-hour at $200/meter, $100/probe, $100 for 306/308; 24-hour at double calibration cost). Drives consumable / aftermarket revenue stream from installed base.
6. Custom Engineering Solutions: Custom designed UV exposure, mask aligner, and meter/radiometer solutions built to unique customer specifications; engages OAI application engineers for bespoke systems.
7. Radiation Power Systems — Power Supplies: Sale of acquired Radiation Power Systems brand of mercury and xenon arc lamp power supplies serving semiconductor lithography, PCB fabrication, UV curing, solar simulation, and photometry customers.

Pricing tiers

Go-to-market motion4 records

Distribution channels5 records

Marketing channels7 records

Core offering

OAI manufactures precision photolithography capital equipment (mask aligners from tabletop R&D units such as Model 200/200IR/200E/212 to automated production systems Model 800E, 6000, 6000A-MC, and large-substrate Model 6020), UV light sources and flood exposure systems (Model 30, 30E, 30L, 32 UV LED, 2000AF/SM, 2012AF/SM), UV light/energy meters and probes (Model 308, 308T, 656, 659), resistivity meters (Hiresta UX, Loresta FX, Loresta GX II), and a complete solar/PV testing line (TriSOL Class AAA/CPV/Large Area/Multijunction solar simulators, I-V testers, EL imaging testers, automated I-V/AOI/EL sorting systems, calibrated reference cells). The company supports its installed base with NIST-traceable calibration services and offers custom-engineered UV exposure, mask aligner, and meter solutions. Products are manufactured in Milpitas, California and sold to semiconductor fabs, MEMS manufacturers, microfluidics researchers, advanced packaging providers, and PV/solar cell producers worldwide.

Product overview

OAI is a multi-product precision equipment manufacturer (not a single unified product or platform-plus-modules architecture) operating a broad portfolio of standalone product lines spanning photolithography, UV exposure, UV measurement, resistivity measurement, and solar/PV testing. The portfolio centers on Mask Aligners (Model 200, 200IR, 200E, 212, 800E, 6000, 6000A-MC, 6020) and is complemented by UV Light Sources (Model 30, 30E, 30L, 32 UV LED), UV Light and Energy Meters (Model 308, 308T, 656, 659) with their Probes, Resistivity Meters (Hiresta UX, Loresta FX, Loresta GX II), Solar Simulators (TriSOL Standard TSS, CPV, Large Area, Multijunction, 0.25° Collimation Angle), I-V Test Systems (Standalone and Integrated), Solar Power Meters (Flash, Continuous Wave), Calibrated Reference Cells, Automated I-V/AOI/EL Sorting Systems, the AML Wafer Bonder, and specialty modules including Nanoimprint, CLiPP, Mask Treatment Model 100MT, and UV Ozone Surface Treatment Plus. The recently acquired Radiation Power Systems brand extends the portfolio into power supplies for mercury and xenon arc lamps. Several products integrate into cluster configurations, most notably the C&D P9000 / OAI 6000 Integrated Lithography Cell. All products are supported by NIST-traceable Calibration Services and a global Service and Support network.

Differentiator

Problem solved

Functional benefit

Brands

• Radiation Power Systems: Acquired brand supplying power supplies for mercury and xenon arc lamps serving semiconductor lithography, PCB fabrication, UV curing, solar simulation, and photometry applications.
• TriSOL

Products and services

• Model 6000 Automated Front & Backside Mask Aligner System Automated production mask aligner with submicron frontside and backside alignment accuracy, ±3% beam uniformity, and 200 WPH throughput for production semiconductors, MEMS, sensors, advanced packaging, IoT, and microfluidics.
• Model C&D P9000 / OAI 6000 Integrated Lithography Cell Partner-built integrated lithography cluster tool combining the OAI Model 6000 mask aligner with the C&D P9000 coater/developer track; enables Coat, Bake, Align/Expose, and Develop in a single tool with parallel application processing.
• Model 800E Front & Backside Semi-Automatic Mask Aligner High-performance semi-automatic mask aligner with Advanced Beam Optics, Windows 7 PC control, joystick alignment, and upgradable Precision Lithography Modules for R&D and low-volume production.
• Model 200 Tabletop Mask Aligner Cost-effective tabletop mask aligner for R&D and limited-scale pilot production, with one micron resolution, air bearing/vacuum chuck leveling, and collimated Near or Deep UV exposure from 200W to 2000W lamps.
• Model 200IR Tabletop Frontside & Backside Mask Aligner Tabletop frontside and backside mask aligner for R&D and pilot production with one micron resolution, air bearing/vacuum chuck leveling, and collimated Near or Deep UV light source.
• Model 200E DUV Mask Aligner Extreme deep-UV mask aligner operating at 170–200nm using a 185nm Excimer lamp, performing all functions of the tabletop Model 200 for biotechnology processing.
• Model 212 Large Area Tabletop Mask Aligner Low-cost tabletop mask aligner for large area substrates up to 12"x12" or 300mm diameter, based on OAI's modular platform, for R&D requiring a cost-effective 300mm mask aligner.
• Model 6000A-MC Automated Production Mask Aligner with Integrated Mask Changer Automated production mask aligner with integrated mask changer handling 10–150 masks, equipped with a bar code reader for mask-to-process coordination, ideal for semiconductor and bio-tech applications.
• Model 6020 Large Substrate Mask Aligner / Large Substrate Exposure System Large substrate mask aligner/exposure system for glass panels and large-area substrates, with ±10% beam uniformity and ≤2.0µ printing resolution across a wide range of substrate thicknesses.
• Model 30 UV Light Source Stand-alone UV light source with proprietary optical integrator delivering a highly uniform UV beam; beam sizes up to 24in², output spectra 220–450nm, output power 200W–5kW, with quick-change filter assemblies.
• Model 30E Enhanced UV Light Source Enhanced stand-alone UV light source with rotating chuck for improved flood exposure uniformity, dual channel intensity controllers, beam sizes up to 24in² and output power 200W–5kW.
• Model 30L Large Area UV Light Source Large area collimated UV light source with up to 10kW output power using collimating mirrors for high-efficiency large-scale UV applications.
• Model 32 UV LED Light Source Mercury-free UV LED light source with prism array and light pipe, delivering better than ±4% beam uniformity, variable intensities at 365nm and 405nm, no maintenance or light replacement required.
• Model 2000AF & 2000SM Exposure Systems Configurable edge-bead or flood exposure system with UV light source, intensity-controlled power supply, and robotic substrate handling; capable of 6µ resolution at 25µ separation.
• Model 2012AF & 2012SM Exposure Systems Cost-effective edge-bead removal or automated flood exposure system using shadow mask technology with rapid mask/substrate changeover and FOUP loading for 8" to 300mm wafers.
• Model 308 UV Light Meter Direct-reading handheld UV light meter with detachable probes for UVA/UVB/UVC ranges, auto-ranging 0.1–1999.9 mW/cm² with ±3% accuracy and NIST-traceable measurements.
• Model 308T UV Light Meter Direct-reading handheld UV light meter built for high-intensity UV curing applications, with detachable UVA/UVB/UVC probes and NIST-traceable measurements.
• Model 656 Light and Energy Meter UV light and energy meter for calibrated control of photolithography processes on mask aligners and flood exposure systems in semiconductor, MEMS, wafer packaging, and wafer bumping industries.
• Model 659 UV Light and Energy Meter Advanced UV exposure analyzer for wafer steppers, averaging up to 400 exposure readings with intensity range up to 7,500 mW/cm², Ethernet and USB interface, and NIST traceability.
• Hiresta UX High Resistivity Meter High-resistivity meter for surface and volume resistivity of nonconductive materials, with 10³–10¹⁴Ω measurement range, 7.5" touch panel, and ASTM D257/JIS K 6911 compliance.
• Loresta FX Low Resistivity Meter Handheld 4-pin low-resistivity meter with one-touch Ω, Ω/sq, Ω-cm readings, auto-hold, RS232 output, and optional data logger; measurement range 10⁻² to 10⁶Ω with JIS compliance.
• Loresta GX II Low Resistivity Meter Multi-purpose 4-pin low-resistivity meter with resistivity correction software, 10⁻⁴–10⁷Ω range, MCP probe for one-touch readings, and ASTM D257/JIS K 6911 compliance.
• TriSOL Standard Class AAA (TSS) Solar Simulator Class AAA standard solar simulator delivering highly collimated, uniform light with Advanced Uniform Beam Optics; output rated 350W–5,000W and certified to ASTM E927-05, IEC 60904-9, and JIS C8912.
• TriSOL CPV Solar Simulators (Low Dose and High Dose) Concentrating Photovoltaics (CPV) solar simulators available in Low Dose (up to 50 Suns) and High Dose (up to 1500 Suns) configurations; Class AAA certified with lamp housings from 1kW to 7.0kW.
• TriSOL Large Area Solar Simulator Large area solar simulator in Class AAA, ABA, or ACA configurations, including Large Area Full Room (5m×5m×3m), Large Area IR, and Large Area PV variants with configurable beam direction.
• TriSOL Class AAA 0.25° Collimation Angle Solar Simulator High-performance 0.25° collimation angle solar simulator for space applications, with 100mm×100mm beam, AM1.5G/AM0 spectrum up to 1800nm, and intensity up to 1.25 SUNS.
• Multijunction Solar Simulator Solar simulator for multijunction and standard solar cells, delivering 350–1800nm Class AAA spectral match with 300W–5000W lamp power, configurable as continuous wave or Single Long Pass.
• Automated I-V/AOI/EL and Sorting System (Model 10000A-I-V) High-performance in-line automated I-V, AOI, and EL inspection and sorting/binning system for Si solar cells at ~2,800 WPH with 48 bins, tac time of 1.25 seconds, and up to 12 busbar support.
• EL Imaging Tester Electroluminescence imaging tester for Si solar cells using a 1024×1024 CCD camera with 1µm pixel size, multi-megahertz readout, and 900–1100nm sensitivity.
• Single Long Pulse Solar Test System for High Efficiency Cells Single long pulse solar simulator and I-V test system for high-efficiency solar cells, with 75–200ms pulse width and <15V/sec sweep rates to handle high-capacitance cells.
• Standalone I-V Test Systems High-performance standalone I-V testers with I-V Rider software, available in standard ranges up to 20A and as custom higher-current configurations; orderable as standalone or integrated with OAI solar simulators.
• Integrated I-V Test Systems Fully integrated I-V test system combining a Class AAA solar simulator, custom test fixture, source meter, I-V software, and calibrated Si reference cell; verified at Fraunhofer ISE and NREL with >99% uptime and >1.3M wafer passes per lamp.
• Flash Solar Power Meter Irradiance meter (in Suns) for flash solar simulators, sampling up to 4000Hz, with NIST-certified reference cell traceable to NREL per IEC-60904-2.
• Continuous Wave Solar Power Meter Irradiance meter (in Suns) for continuous wave solar simulators, with USB data collection, desktop software, rechargeable lithium-ion battery, and k-type thermocouple/RTD support.
• Calibrated Reference Cells Calibrated solar reference cells (2cm×2cm photovoltaic cell in metal enclosure with protective window and Type-K/RTD temperature sensor) for solar simulator irradiance calibration, with cycle calibration via OAI's laboratory.
• AML Wafer Bonder Wafer bonder that performs in-situ alignment and bonding within a high vacuum chamber, supporting anodic bonding, silicon direct bonding, and thermal compression bonding for MEMS and micro-engineering applications.
• Radiation Power Systems Acquired product line of mercury and xenon arc lamp power supplies serving semiconductor lithography, PCB fabrication, UV curing, solar simulation, and photometry/optics testing customers, sold under the Radiation Power Systems brand through OAI.
• Calibration Services NIST-traceable calibration services for UV light measurement instruments, with a standard 10-business-day turnaround and 24-hour and 48-hour rush options; recognized as the standard for UV light measurement by most U.S. semiconductor fabs.
• Custom Engineering Solutions Custom-engineered UV exposure, mask aligner, and meter/radiometer solutions built to unique customer specifications, delivered through OAI application engineers.

Quantifiable outcome

• Submicron frontside and backside alignment accuracy with ±0.5μm topside alignment on Model 6000
• +9 more outcomes

Named customers18 records

Segments10 records

Ideal customer profiles4 records

Technology focussed Yes

API detail

Has API

No

API docs

API detail

Core technology

AI maturity

App detail

Integration1 record

Feature8 records

Partnerships

Three partnerships are on record, tiered flagship and core.

• C&D SemiconductorsflagshipStrategic or Co-development Partner · 19 November 2025Strategic co-development partner for the Model C&D P9000 / OAI 6000 Integrated Lithography Cell (Coat | Bake | Align/Expose | Develop), fully manufactured in the USA. P9000 acts as the master user interface and the cluster configuration allows dynamic wafer flow and parallel application processing with fewer operators. Jointly exhibited at SPIE Advanced Lithography and Patterning (San Jose, CA — Booths 711 and 713).
• Radiation Power SystemscoreOEM/ Whitelabel/ Licensing PartnerAcquired by OAI ('OAI is proud to welcome Radiation Power Systems into our family of solutions'). Radiation Power Systems supplies power supplies for mercury and xenon arc lamps serving semiconductor lithography, PCB fabrication, UV curing, solar simulation, and photometry/optics testing customers. Their power supplies are now sold through OAI under the Radiation Power Systems brand.
• Proven partner company (Automation partner for 10000A-I-V System)coreImplementation/ SI/ Consulting PartnerOAI notes 'OAI works with a proven partner company to provide automation' for the 10000A-I-V Automated I-V/AOI/EL and Sorting System, which is a high-performance in-line automated inline system with manual load cassettes, automated conveyor, three I-V/AOI/EL inspection stations and 48-bin sorting at ~2,800 WPH.

Scale indicators8 records

Recent moves6 records

Expansion highlights5 records

Direct peers

• SUSS MicroTec: SUSS MicroTec is the closest direct peer to OAI in mask aligners and proximity lithography equipment, offering manual, semi-automated, and automated mask aligners for semiconductor, MEMS, advanced packaging, and 3D integration customers. Like OAI, it serves R&D and production fabs globally and competes head-to-head in the same product category.
• EV Group (EVG): EV Group is a direct peer in mask alignment, nanoimprint lithography, and wafer bonding for MEMS, advanced packaging, and semiconductor manufacturing. EVG's wafer bonders compete with OAI's AML Wafer Bonder, and its SmartNIL nanoimprint technology overlaps with OAI's Nanoimprint Module in R&D and low-volume production.
• Heidelberg Instruments: Heidelberg Instruments manufactures direct-write lithography systems (maskless aligners) for MEMS, photonics, advanced packaging, and R&D applications. It competes directly with OAI in the mask aligner / lithography equipment market for MEMS, microfluidics, and research customers, addressing similar sub-micron patterning needs.
• Nanonex: Nanonex specializes in nanoimprint lithography (NIL) tools and is a direct competitor to OAI's Nanoimprint Module offering. Both companies target R&D and pilot-production customers in MEMS, photonics, bio-medical, and nanotech who need low-cost, high-throughput nanopatterning solutions.
• Neutronix Quintel (NXQ): Neutronix (formerly Quintel) supplies mask aligners and proximity lithography equipment for semiconductor, MEMS, and compound semiconductor applications. It directly competes with OAI in mask alignment tools for fab and R&D customers, including backside alignment and thick-wafer handling use cases.
• Abet Technologies: Abet Technologies manufactures solar simulators, UV light sources, and characterization instruments for PV, photochemistry, and materials testing — directly comparable to OAI's TriSOL solar simulator family and UV light/energy meter product lines. Both serve solar cell R&D, production testing, and photobiology/photochemistry customers.

Broad incumbents

• ASML: ASML is the dominant global lithography incumbent (EUV/DUV steppers) and a customer/adjacent ecosystem participant rather than direct competitor to OAI's mask aligners. ASML's customer base overlaps with OAI's (TSMC, Applied Materials, etc.), and its scale dwarfs OAI; relevant as the broad incumbent shaping the lithography market in which OAI operates.
• Nikon Precision: Nikon is a broad incumbent in lithography (DUV/i-line steppers and scanners) serving semiconductor fabs and is on OAI's customer list. While its stepper/scanner portfolio targets higher-end patterning than OAI's mask aligners, Nikon competes for similar fab capex dollars and shapes the broader lithography equipment market.
• Canon (Canon Anelva): Canon is a broad incumbent in semiconductor lithography (i-line and KrF steppers, nanoimprint tools) and a large diversified imaging/equipment conglomerate. While Canon addresses higher-end nodes than OAI, its nanoimprint lithography push directly overlaps with OAI's Nanoimprint Module positioning in R&D and packaging.
• Newport (MKS Instruments): Newport (part of MKS Instruments) is a broad incumbent in photonics, lasers, and optical/UV measurement instrumentation, overlapping with OAI's UV light/energy meters, light sources, and solar simulator products. Newport serves semiconductor, research, and PV customers with a much broader instrument portfolio, making it a partial broad incumbent rather than direct specialist competitor.

Market position

Strengths5 records

Weaknesses5 records

Competitive moat5 records

Key risks6 records

Key highlights7 records

Customer concentration

• YouTubeyoutube.com/@oai
• LinkedInlinkedin.com/company/oai

Compliance7 records

Revenue estimate

Valuation estimate

Number of profiles

Subsidiaries1 record

Funding overview

Funding rounds

Investors

Funding detail is available on the Subscription and Enterprise plan.Contact sales →

M&A

Investments

M&A and investment is available on the Subscription and Enterprise plan.Contact sales →

Frequently asked questions about OAI