GenISys
GenISys GmbH develops and sells specialized lithography and SEM metrology software (BEAMER, LAB, TRACER, MASKER, ProSEM, InSPEC) for nanofabrication, serving equipment OEMs (JEOL, Raith, Heidelberg Instruments), research universities, and government labs globally.
- Company typePrivate
- Founded2005
- HeadquartersTaufkirchen, Germany
- Headcount11–50
- GTM typeB2B
- OfferingSoftware
What GenISys does
GenISys GmbH is a privately held German software company founded in 2005 and headquartered in Unterhaching near Munich, with regional subsidiaries in the United States (San Francisco), Japan (Yokohama), and Turkey (Izmir). Since 2018, GenISys has been a portfolio company of RSBG (RAG-Stiftung Investment Company), a German industrial holding group.
The company develops and markets a suite of specialized software for the optimization of lithography and inspection in nanofabrication processes. Its core products are BEAMER (data preparation, fracturing, and proximity/process correction for electron- and laser-beam direct write), LAB (3D lithography simulation and OPC across proximity, projection, laser, and e-beam), TRACER (Monte Carlo point-spread-function simulation and process calibration), MASKER (mask data preparation for displays, photonics, and IoT), ProSEM (offline SEM image metrology), and InSPEC (integrated SEM metrology and inspection suite launched in 2024). The technology rests on physics-based algorithms including Monte Carlo electron-solid interaction modeling, rule- and model-based proximity/OPC, and shared PSF libraries across tools.
GenISys operates a hybrid distribution model combining direct enterprise sales through its regional subsidiaries with deep OEM bundling partnerships: BEAMER ships with e-beam systems from JEOL, Raith (formerly Vistec), Elionix, Crestec, and Advantest; LAB bundles with EVG and SÜSS mask aligners; and a 2014 cooperation agreement integrates BEAMER and LAB with Heidelberg Instruments' laser lithography tools. Customers are concentrated in research universities and government nanofabrication centers (e.g., NIST, Lawrence Livermore, Paul Scherrer Institute, Georgia Tech, Stanford, TUM, EPFL) along with a smaller set of industrial users in photonics, displays, and quantum devices. Revenue is generated primarily through perpetual software licenses with 12 months of included maintenance, plus annual maintenance contracts, subscription licensing for LAB, and supporting training and technical services.
GenISys firmographics
Firmographics- Name
- GenISys
- Legal name
- GenISys GmbH
- Website
- https://genisys-gmbh.com
- Company type
- Private
- Founded year
- 2005
- Operating status
- Operating
- Headcount range
- 11–50 employees
- Short description
- GenISys GmbH develops and sells specialized lithography and SEM metrology software (BEAMER, LAB, TRACER, MASKER, ProSEM, InSPEC) for nanofabrication, serving equipment OEMs (JEOL, Raith, Heidelberg Instruments), research universities, and government labs globally.
- Ownership category
- akta.pro rank
GenISys industry classification
Industry- Product category
- Lithography Software for Nanofabrication
- NAICS
- Semiconductor Machinery Manufacturing (333242), Navigational, Measuring, Electromedical, and Control Instruments Manufacturing (3345), Analytical Laboratory Instrument Manufacturing (334516)
- SIC
- Optical Instruments & Lenses (3827), Instruments For Meas & Testing Of Electricity & Elec Signals (3825)
- akta.pro primary industry
- Metrology, Inspection & Process Control Equipment (HDAHAEAH)
- akta.pro secondary industries
- Metrology & Inspection Systems (CMM, Laser Trackers, Optical Comparators) (IMAAAHAC), In-Process Monitoring & Closed-Loop Metrology for AM (IMAAAHAF), Dimensional Inspection Software (GD&T, SPC, Reporting) (IMAAAHAD)
Keywords
Where GenISys is headquartered
LocationHeadquarters
- HQ city
- Taufkirchen
- HQ country
- Germany
- HQ region
- Europe
Offices4 records
Markets served
GenISys business model
Business model- GTM type
- B2B
- Offering type
- Software
- Cost components
- Personnel, Technology or R&D, Marketing or Sales, Operations
Revenue model
- Software Licenses (BEAMER, LAB, TRACER, MASKER, ProSEM, InSPEC): GenISys sells perpetual software licenses bundled with equipment from OEM partners (JEOL, Raith, Elionix, Crestec, Advantest, EVG, SÜSS, Heidelberg Instruments). Licenses include 12 months maintenance service. The company also offers flexible licensing with USB license keys for standalone and network use, with support for multithreading and parallel processing on computer clusters.
- Software Maintenance and Support: Annual maintenance contracts provide technical support hotline (email, screen sharing, phone), frequent updates with new features and bug fixes, regional trainings, technical workshops, and user meetings. User feature requests are given high priority for future updates.
- Training and Technical Services: Regional trainings, technical workshops, and user meetings are offered as part of the customer support ecosystem. Installation, training, and resolving customer issues are included as part of post-sale support activities.
Pricing tiers
| Model | Billing | Price |
|---|---|---|
| One time/ perpetual license | Multi-year contract | BEAMER - Enterprise lithography software with comprehensive features |
| Subscription | Annual | LAB - Lithography simulation platform available in different license packages |
| One time/ perpetual license | Multi-year contract | TRACER - Monte Carlo PSF simulation and process calibration |
Go-to-market motion3 records
Distribution channels4 records
Marketing channels5 records
GenISys product offering
Product offeringCore offering
GenISys develops, markets, and supports software solutions for the optimization of lithography and inspection for micro- and nano-fabrication processes. Its products handle layout data preparation, fracturing, proximity and process correction (PEC), lithography process modeling, Monte Carlo electron-solid interaction simulation, mask data preparation, optical proximity correction (OPC), and SEM-based metrology and inspection.
Product overview
GenISys provides a comprehensive suite of software solutions for lithography optimization and SEM-based metrology and inspection. The product portfolio centers on BEAMER (core e-beam/laser-beam lithography data preparation software), LAB (3D lithography simulation platform), TRACER (Monte Carlo PSF simulation), and MASKER (mask data preparation). For metrology and inspection, GenISys offers ProSEM (SEM image analysis) and InSPEC (integrated SEM metrology suite). These products work both as standalone tools and in combination—BEAMER and TRACER integrate for proximity effect correction workflows, while LAB provides simulation capabilities across all lithography techniques. VIEWER is available as a standalone layout inspection tool. The company serves nano-fabrication centers, semiconductor industry, flat panel display manufacturers, and research institutions.
Differentiator
Problem solved
Functional benefit
Brands
- BEAMER: Electron- and laser-beam lithography software for data preparation, fracturing, PEC and process correction
- LAB
- TRACER
- MASKER
- ProSEM
- InSPEC
Products and services
- BEAMER BEAMER is the most comprehensive lithography software for optimized electron- and laser-beam exposure, providing data preparation including fracturing, proximity effect correction (PEC), process correction, curved fracturing, field positioning, and write sequence control for demanding e-beam and laser-beam lithography applications. It targets process engineers at research universities, nanofabrication centers, and industrial manufacturers.
- LAB LAB is a 3D lithography simulation software platform covering projection stepper, proximity aligner, laser, and e-beam lithography. It enables computational design and process optimization through simulation, OPC, and layout verification, serving the flat panel display industry and OPC applications in industrial and research accounts.
- TRACER TRACER is a Monte Carlo simulator that computes electron-solid interaction for any arbitrary material stack and performs advanced process calibration for electron beam proximity effect correction. It calculates point spread functions (PSF) and determines base dose factors for different substrates, integrating with BEAMER and LAB for shared PSF libraries.
- MASKER MASKER is mask data preparation and mask process correction software optimized for highest productivity and quality in photonics, displays, IoT, and special devices. It extends BEAMER technologies for non-Manhattan layout handling and advanced proximity correction via a hierarchy engine and rule- and model-based MPC for laser and e-beam mask exposure.
- ProSEM ProSEM is an advanced SEM image analysis, metrology, and automation software package providing consistent feature measurements for process calibration and monitoring. It features advanced contour detection and optional digital interfaces for automated image acquisition from SEM tools.
- InSPEC InSPEC is an integrated SEM metrology and inspection software suite and upgrade kit that converts SEM tools into versatile metrology instruments. It enables advanced multi-chip jobs with integrated workflow of scanning, contour detection, corrections, and data processing.
- VIEWER VIEWER is a standalone software package providing layout inspection at all stages, comparing layouts in multi-view mode, measurement functions, metrology support, writing field placement, dose assignment, and shot placement visualization.
Quantifiable outcome
- Trial and error optimizations in lithography are very expensive and time consuming; PEC eliminates the need to experimentally adjust the exposure dose for each layout, increasing productivity and process reproducibility
- +2 more outcomes
Companies that use GenISys
Customer profileNamed customers20 records
Segments4 records
Ideal customer profiles3 records
GenISys technology and API
TechnologyTechnology focussed Yes
API detail
- Has API
- No
- API docs
- API detail
Core technology
AI maturity
App detail
Feature8 records
GenISys partnerships and signals
Strategic signalPartnerships
Six partnerships are on record, tiered minor and core.
- MIT.nano ConsortiumminorLAB14 GmbH, a German corporate network uniting eight high-tech companies focused on nanofabrication, microfabrication, and surface analysis (including GenISys), has joined the MIT.nano Consortium. LAB14 will contribute equipment (VPG 300 DI maskless stepper and EnviroMETROS XPS tool) to MIT.nano's cleanroom and enable direct collaboration between LAB14's industry network and MIT.nano researchers to accelerate innovation in micro- and nanotechnology.
- Heidelberg Instruments Mikrotechnik GmbH (HIMT)coreHeidelberg Instruments and GenISys announced a Cooperation Agreement to combine BEAMER and LAB data-preparation, simulation and process correction software packages with HIMT laser lithography tools. The proximity and process effect correction in combination with the DWL exposure systems were a key enabler for gray-scale laser lithography.
- EV Group (EVG)coreEVG signed a distribution agreement to bundle LAB lithography simulation software with their mask aligners. LAB simulation for proximity lithography using mask aligners was a unique feature that enabled the partnership.
- SÜSS MicroOpticscoreSÜSS signed a distribution agreement to bundle LAB with their mask aligners. LAB supports SÜSS Exposure Optics enabling source shape and source mask optimization (SMO). This partnership supports the flat panel display industry and other applications.
- JEOLcoreJEOL signed a distribution agreement to bundle BEAMER software with their e-beam lithography equipment. JEOL was one of the first major e-beam lithography equipment manufacturers to partner with GenISys, enabling BEAMER to be shipped with JEOL systems worldwide.
- Vistec (now Raith)coreVistec (today Raith) signed a distribution agreement to bundle BEAMER software with their e-beam lithography systems, following JEOL. This partnership expanded BEAMER's reach in the European and global market.
Scale indicators7 records
Recent moves7 records
Expansion highlights4 records
GenISys competitors and assessment
Company assessmentBroad incumbents
- ASML: ASML is the dominant optical lithography equipment vendor. While it serves a different (mainstream IC) lithography node, its scale, R&D depth and software roadmap are a relevant competitive backdrop for any lithography-software adjacent business.
- EV Group (EVG): EVG is a major mask-aligner and nano-imprint lithography equipment vendor that bundles GenISys's LAB software. Tight technology and channel partnership with significant overlap in customer base (FPD, MEMS, photonics).
- KLA Corporation: KLA is the leading semiconductor metrology and inspection equipment vendor. Most relevant as a competitive incumbent against GenISys's ProSEM and InSPEC in SEM-based metrology and inspection.
- Heidelberg Instruments Mikrotechnik: A core OEM partner bundling GenISys BEAMER and LAB with its DWL laser lithography tools. A natural adjacent peer: same customers (nano-fabrication centers), same conferences (MNE, EIPBN), and joint product positioning in grayscale and mask-less laser lithography.
- Cadence Design Systems: Cadence is a major EDA vendor with photonic/physical verification tools that intersect with GenISys's nanofabrication simulation stack. Less direct competition in core e-beam data prep but a major incumbent in adjacent layout/preparation tooling.
- SÜSS MicroTec: SÜSS MicroTec manufactures mask aligners and proximity lithography tools used in flat panel display and MEMS production and bundles GenISys LAB. Operates in the same lithography process step as GenISys's industrial users.
- Raith (formerly Vistec): Raith is a leading e-beam direct-write and nano-fabrication equipment vendor that bundles BEAMER. Targets the same research and nanofabrication centers as GenISys and is a core channel partner.
- JEOL: JEOL is a major e-beam lithography equipment manufacturer and the first OEM to bundle BEAMER with its e-beam systems. Comparable end customers and a tightly coupled technology/Go-to-Market relationship with GenISys.
Direct peers
- Siemens EDA (Calibre): Siemens EDA's Calibre is the dominant commercial OPC and lithography verification platform for mask and wafer semiconductor manufacturing. It competes most directly with GenISys's LAB (model-based OPC and simulation) and MASKER in mask data preparation.
- Synopsys: Synopsys provides OPC, lithography simulation and mask data preparation tools (e.g., Proteus, CATS) used across the semiconductor and mask-making industries. Competes with GenISys's LAB and MASKER in OPC and layout-to-mask workflows.
Market position
Strengths5 records
Weaknesses5 records
Competitive moat4 records
Key risks6 records
Key highlights7 records
Customer concentration
GenISys social profiles
Digital presenceGenISys financial estimates
Financial estimateRevenue estimate
Valuation estimate
GenISys leadership team
Management profileNumber of profiles
Profiles7 records
GenISys subsidiaries and ownership
Company hierarchySubsidiaries4 records
GenISys funding detail
Funding detailFunding overview
Funding rounds
Investors
Funding detail is available on the Subscription and Enterprise plan.Contact sales →
GenISys M&A and investment
M&A and investmentM&A
Investments
M&A and investment is available on the Subscription and Enterprise plan.Contact sales →
Frequently asked questions about GenISys
What does GenISys do?
GenISys develops, markets, and supports software solutions for the optimization of lithography and inspection for micro- and nano-fabrication processes. Its products handle layout data preparation, fracturing, proximity and process correction (PEC), lithography process modeling, Monte Carlo electron-solid interaction simulation, mask data preparation, optical proximity correction (OPC), and SEM-based metrology and inspection.
Is GenISys a public or private company?
GenISys is a private company. It is classified as corporate owned and is currently operating.
When was GenISys founded?
GenISys was founded in 2005. It employs 11 to 50 people.
Where is GenISys based?
GenISys is headquartered in Taufkirchen, Germany, in the Europe region.
How does GenISys make money?
Three revenue lines are on record. Software Licenses (BEAMER, LAB, TRACER, MASKER, ProSEM, InSPEC) is the primary driver. The others are software Maintenance and Support and training and Technical Services.
Who are GenISys's main competitors?
Broad incumbents on record are ASML, EV Group (EVG), KLA Corporation, Heidelberg Instruments Mikrotechnik, Cadence Design Systems, SÜSS MicroTec, Raith (formerly Vistec) and JEOL. Direct peers are Siemens EDA (Calibre) and Synopsys.
Does GenISys have an API?
No public API is recorded for GenISys.
What industry is GenISys in?
GenISys's product category is Lithography Software for Nanofabrication. Its primary akta.pro industry code is HDAHAEAH, Metrology, Inspection & Process Control Equipment, with a secondary code of IMAAAHAC, Metrology & Inspection Systems (CMM, Laser Trackers, Optical Comparators). Its NAICS code is 333242 and its SIC code is 3827.