What Nano System Solutions does

Nano System Solutions (株式会社ナノシステムソリューションズ) is a Japanese precision optical equipment manufacturer founded in December 2004 as an AIST (National Institute of Advanced Industrial Science and Technology) technology transfer venture. The company designs and produces semiconductor manufacturing and inspection equipment, with a core technology stack built around Digital Micromirror Device (DMD)-based maskless lithography combined with proprietary optical and image processing technologies. Its product portfolio includes the DL-series maskless lithography systems (DL-1000 and DL-2500i), semiconductor mask writers for binary and phase-shift photomask fabrication, visual inspection systems for Si-wafer and glass substrate defects, and the IP-0800 intelligent edge polishing system for compound semiconductor wafers. The company serves semiconductor manufacturers, national research institutes, universities, and government-funded research organizations across Japan and Asia (Taiwan, China, Korea), and has cumulatively delivered 60+ units of maskless lithography equipment. It holds 26 owned patents (19 Japan, 7 overseas) as of July 2024.

The company operates from a Class 100/1000 cleanroom headquarters and factory in Uruma City, Okinawa (relocated from Tokyo in April 2015 to leverage proximity to Asian semiconductor markets and the local climate for energy-efficient cleanroom operation), with additional offices in Tokyo, Fukushima, and Saga. Revenue derives from three streams: (1) hardware sales of capital equipment to corporate customers, (2) maintenance and after-sales services for the installed base, and (3) a foundry/contract manufacturing business using proprietary maskless lithography and laser processing for precision molds and special glass. Go-to-market is exclusively direct enterprise field sales supported by sales engineers, supplemented by SEMICON Japan/Taiwan and regional exhibition participation; pricing is not publicly disclosed and is handled through direct inquiry. The company became a wholly-owned subsidiary of V-Technology Co., Ltd. (Tokyo Stock Exchange Prime Market) in August 2019 and operates under a concentrated ownership structure with no public revenue disclosure.

Recent strategic activity signals repositioning: in 2022 NSS acquired EFE Corporation (absorbed via merger October 2023), in July 2024 it launched the DL-2500i with more than 4x throughput improvement, in August 2024 it acquired HSTVision Inc. and installed a new CEO (Kazuyuki Hiramoto), and in June 2025 it consolidated its Tokyo-area offices into a single Tama-city location.

Name

Nano System Solutions

Legal name

株式会社ナノシステムソリューションズ

Website

https://nanosystem-solutions.com

Company type

Private

Founded year

2004

Operating status

Operating

Headcount range

11–50 employees

Short description

Nano System Solutions is a Japanese precision optical equipment manufacturer (founded 2004, V-Technology subsidiary) producing DMD-based maskless lithography systems, semiconductor mask writers, visual inspection systems, and edge polishing equipment for semiconductor manufacturers, research institutions, and universities across Japan and Asia.

Ownership category

akta.pro rank

Product category

Semiconductor Manufacturing Equipment

NAICS

Semiconductor Machinery Manufacturing (333242)

akta.pro primary industry

Lithography Equipment (DUV/EUV) (HDAHAEAA)

akta.pro secondary industry

Mask/Reticle Manufacturing & Inspection Equipment (HDAHAEAK)

Keywords

• Semiconductor manufacturing equipment
• Maskless lithography systems
• Wafer inspection equipment
• Photomask writers
• Edge polishing equipment

Headquarters

HQ city

Kanagawa

HQ country

Japan

HQ region

Asia

Offices4 records

Markets served

GTM type

B2B

Offering type

Hardware or Manufacturing

Cost components

Personnel, Technology or R&D, Operations, Marketing or Sales, Infrastructure, Supply Chain

Revenue model

1. Semiconductor Manufacturing Equipment Sales: Sale of maskless lithography systems (DL-1000, DL-2500i), semiconductor mask writers, visual inspection systems, and intelligent edge polishing systems. Products are sold directly to semiconductor manufacturers, research institutions, and electronics companies.
2. Maintenance and After-Sales Services: Ongoing maintenance, support, and technical services for sold equipment. The company provides product support, field engineering, and spare parts for installed base.
3. Foundry/Contract Manufacturing: Commissioned processing business using proprietary maskless lithography and laser processing equipment for precision molds, special glass including sapphire, leveraging the company's Okinawa-based manufacturing facility.

Pricing tiers

Go-to-market motion2 records

Distribution channels1 record

Marketing channels6 records

Core offering

Nano System Solutions designs and manufactures DMD-based maskless lithography systems, semiconductor mask writers, wafer and glass substrate visual inspection systems, and an intelligent edge polishing system for compound semiconductors. It also operates a foundry/contract manufacturing service using its own lithography and laser equipment for precision mold and special glass (including sapphire) processing, supported by ongoing maintenance and after-sales service.

Product overview

Nano System Solutions develops and manufactures precision optical and laser-based semiconductor manufacturing and inspection equipment. The current product portfolio consists of four core product lines: the DL-series maskless lithography systems (DL-2500i and DL-1000) using DMD spatial light modulation for mask-free digital exposure; the mask writer for semiconductor photomask fabrication with consumable-free design; visual inspection systems for defect detection on wafers and glass substrates; and the IP-0800 intelligent edge polishing system for compound semiconductors. The wafer ID reader line (TAKUMI/KSC series) has been discontinued. The company also operates a foundry business using its maskless lithography and laser processing equipment for precision mold and special glass machining.

Differentiator

Problem solved

Functional benefit

Brands

• DL-1000: Maskless lithography system utilizing DMD technology for pattern exposure without photomasks
• DL-2500i
• SIFTer300 series
• DynaSearch series N4-1200HR
• Fiber MOPA Laser
• IP-0800

Products and services

• Maskless Lithography System DL-2500i Flagship DMD-based maskless lithography system for semiconductor R&D and small-volume production, enabling direct digital exposure onto photoresist without photomasks with 4x+ throughput, i-line compatibility, grayscale 3D microstructure exposure, real-time autofocus, and TTL coaxial alignment. Target buyers are semiconductor manufacturers, research institutions, and universities in Japan and across Asia.
• Maskless Lithography System DL-1000 DMD-based maskless lithography system providing direct digital exposure without photomasks at 0.5 micrometer standard resolution (with 1 micrometer and 2 micrometer options), scanning and step-and-repeat modes, grayscale 3D microstructure exposure, throughput over 2000 mm²/min, real-time autofocus, and support for substrates from a few millimeters to meter size. Target buyers are semiconductor manufacturers, research institutions, MEMS, LED, FPD, and bio/life sciences researchers.
• Semiconductor Mask Writer Mask writing equipment for binary photomask and phase-shifting mask (PSM) fabrication in advanced technology nodes used in mobile, IoT, and automotive applications. Features distortion-free optics with 500 nm resolution, a proprietary consumable-free design eliminating replacement of light source, lens, and mirrors, original alignment technology, and low power consumption. Target buyers are semiconductor photomask manufacturers.
• Visual Inspection Systems (SIFTer300 and DynaSearch series) Visual inspection systems using proprietary optical and image processing technologies to detect edge chips, cracks, particles, scratches, and pinholes on Si-wafer and glass substrate surfaces. Configurable as edge inspection, back/front surface inspection, or combined multi-function systems; the DynaSearch N4-1200HR also provides nanotopography and roll-off measurement. Target buyers are silicon wafer and substrate manufacturers and semiconductor fabs.
• Intelligent Edge Polishing System IP-0800 Edge polishing system for difficult-to-cut compound semiconductor wafers that uses edge shape measurement-based polishing head position control (optional), a compact polishing head (patent pending), fixed-point and continuous polishing modes, and proprietary polishing tape to improve customer yield. Target buyers are compound semiconductor wafer and device manufacturers.
• Foundry / Contract Manufacturing Service Commissioned processing business using the company's proprietary maskless lithography and laser processing equipment at its Okinawa facility to produce precision molds and process special glass including sapphire for customer orders.
• Maintenance and After-Sales Services Ongoing product support, field engineering, spare parts, and technical services for installed base of maskless lithography, mask writer, inspection, and edge polishing equipment.

Quantifiable outcome

• More than 4x throughput improvement with DL-2500i compared to previous generation maskless lithography systems
• +5 more outcomes

Named customers4 records

Segments6 records

Ideal customer profiles3 records

Technology focussed Yes

API detail

Has API

No

API docs

API detail

Core technology

AI maturity

App detail

Integration2 records

AI capability6 records

Feature8 records

Partnerships

Three partnerships are on record, tiered minor.

• HSTVision Inc. (エイチエスティ・ビジョン株式会社)minorOthers · 5 August 2024NSS acquired all shares of HSTVision Inc. in August 2024, making it a wholly-owned subsidiary. HSTVision Corporation had previously distributed the 'e-Reader 8000' product incorporating NSS's optical technology, and was already a related company before the acquisition.
• EFE Corporation (株式会社イーエフイー)minorOthers · 23 May 2022NSS acquired all shares of EFE Corporation in May 2022, making it a wholly-owned subsidiary. In October 2023, NSS absorbed and merged with EFE Corporation to consolidate operations.
• HSTVision CorporationminorChannel Partner/ Reseller/ Distributor · 5 December 2016HSTVision Corporation distributed the 'e-Reader 8000' product starting January 2016, which incorporated NSS's optics technology. NSS continued to provide maintenance support for existing customers after the product was discontinued.

Scale indicators3 records

Recent moves11 records

Expansion highlights6 records

Broad incumbents

• SCREEN Holdings: Japanese semiconductor equipment conglomerate offering wafer cleaning, coating, and inspection systems. While not a direct lithography competitor, SCREEN serves the same Japanese and Asian semiconductor fab customers and competes for inspection equipment wallet share.
• Lasertec Corporation: Japanese leader in photomask inspection and wafer inspection equipment used by semiconductor manufacturers globally. Overlaps with NSS in mask and wafer inspection segments and shares Japanese semiconductor equipment customer base, though operates at much larger scale.
• KLA Corporation: Global leader in semiconductor process control and inspection equipment, dominating wafer and mask inspection. Competes with NSS's visual inspection product line (SIFTer300, DynaSearch) in wafer defect detection, though at vastly larger scale and broader technology scope.
• ASML Holding: Dutch global monopoly in DUV/EUV lithography for advanced semiconductor manufacturing. While operating at a vastly different resolution tier and customer scale, ASML represents the dominant lithography incumbent whose roadmap trajectory shapes the addressable space for niche maskless players like NSS.
• EV Group (EVG): Austrian supplier of semiconductor and MEMS equipment including lithography, wafer bonding, and nanoimprint systems. Adjacent competitor in maskless and nanoimprint lithography for MEMS and compound semiconductor applications served by NSS.
• SÜSS MicroTec: German manufacturer of semiconductor and MEMS equipment including mask aligners, lithography, and bonding systems. Broader portfolio than NSS but overlaps in photolithography equipment for MEMS, advanced packaging, and specialty semiconductor production.

Direct peers

• Raith GmbH: Dutch/German nanofabrication equipment maker offering maskless electron-beam and laser lithography systems (Voyager, NBL series) for research and industrial nanofabrication. Direct competitor to NSS in maskless patterning, particularly for sub-micron research and specialty production applications.
• Heidelberg Instruments: German manufacturer of maskless lithography systems (DWL series) and direct-write equipment for semiconductor, MEMS, and photonics applications. Heidelberg is the most direct global competitor to NSS in maskless photolithography, offering similar resolution and grayscale capabilities.
• Intelligent Micro Patterning (IMP): US-based developer of maskless photolithography systems using spatial light modulator technology, targeting MEMS, photonics, and semiconductor packaging. Directly comparable to NSS in core technology approach (SLM-based maskless exposure) and target customers.

Emerging players

• JEOL Ltd. Japanese manufacturer of electron-beam lithography and mask-writing systems (JBX series) for semiconductor and nanofabrication applications. Competes with NSS in mask-writing equipment and advanced research lithography, particularly for next-generation mask fabrication.

Market position

Strengths5 records

Weaknesses5 records

Competitive moat5 records

Key risks5 records

Key highlights7 records

Customer concentration

• LinkedInlinkedin.com/company/nanosystem-solutions-inc-

Compliance2 records

Revenue estimate

Valuation estimate

Number of profiles

Profiles5 records

Subsidiaries2 records

Funding overview

Funding rounds

Investors

Funding detail is available on the Subscription and Enterprise plan.Contact sales →

M&A

Investments

M&A and investment is available on the Subscription and Enterprise plan.Contact sales →

Frequently asked questions about Nano System Solutions